A theoretical model for the electrical properties of chromium thin films sputter deposited at oblique incidence

Journal of Physics D: Applied Physics

Volumn 44, Issue 21, 2011, Pages

  Besnard, Aurélien ^a   Martin, Nicolas ^a   Carpentier, Luc ^a   Gallas, Bruno ^b  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL EXPRESSIONS; CHROMIUM THIN FILMS; COLUMN BOUNDARIES; COLUMNAR STRUCTURES; DIFFERENT PROCESS; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTY; FILM PARAMETERS; GLANCING ANGLE DEPOSITION METHODS; OBLIQUE INCIDENCE; SCATTERING MECHANISMS; SPUTTERING PRESSURES; STRUCTURE OF FILMS; SYSTEMATIC STUDY; THEORETICAL MODELS; THREE-DIMENSIONAL MODEL;

CHROMIUM; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON ENERGY LOSS SPECTROSCOPY; GRAIN BOUNDARIES; PRESSURE EFFECTS; SCATTERING; THIN FILMS; VAPOR DEPOSITION;

THREE DIMENSIONAL;

EID: 79956091573     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/21/215301     Document Type: Article

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