Metal-to-dielectric transition induced by annealing of oriented titanium thin films

Functional Materials Letters

Volumn 6, Issue 1, 2013, Pages

  Besnard, Aurélien ^a   Martin, Nicolas ^b   Sthal, Fabrice ^b   Carpentier, Luc ^b   Rauch, Jean Yves ^b  

^a ENSAM   (France)

^b FEMTO ST INSTITUTE   (France)

Author keywords

dielectric; electrical properties; metal; Sputtering; thin films

Indexed keywords

ANNEALING TREATMENTS; COLUMNAR STRUCTURES; CONVENTIONAL SPUTTERING; DC ELECTRICAL CONDUCTIVITY; DC MAGNETRON SPUTTERING; GLANCING ANGLE DEPOSITION METHODS; SPUTTERED PARTICLES; TITANIUM THIN FILMS;

DEPOSITS; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; METALS; SPUTTERING; THIN FILMS; VAPOR DEPOSITION;

TITANIUM;

EID: 84874187690     PISSN: 17936047     EISSN: 17937213     Source Type: Journal    
DOI: 10.1142/S1793604712500518     Document Type: Article

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