Evaluation of photoresist-based nanoparticle removal method for recycling silicon cantilever mass sensors

Sensors and Actuators, A: Physical

Volumn 202, Issue , 2013, Pages 90-99

  Wasisto, Hutomo Suryo ^a   Merzsch, Stephan ^a   Waag, Andreas ^a   Uhde, Erik ^b   Salthammer, Tunga ^b   Peiner, Erwin ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

^b Wilhelm Klauditz Institut (WKI)   (Germany)

Author keywords

Airborne nanoparticles; Cantilever resonators; Photoresist; Quality factor

Indexed keywords

AIRBORNE NANOPARTICLES; CANTILEVER RESONATORS; NANOPARTICLE REMOVALS; PHOTORESIST COATING; QUALITY FACTORS; RECYCLING TECHNIQUES; TEMPERATURE AND RELATIVE HUMIDITY; WORKPLACE CONDITIONS;

NANOCANTILEVERS; NANOPARTICLES; NATURAL FREQUENCIES; Q FACTOR MEASUREMENT; RECYCLING; SENSORS; SILICON;

PHOTORESISTS;

EID: 84887032021     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2012.12.016     Document Type: Article

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