High throughput ultralong (20 cm) nanowire fabrication using a wafer-scale nanograting template

Nano Letters

Volumn 13, Issue 9, 2013, Pages 3978-3984

  Yeon, Jeongho ^a   Lee, Young Jae ^b   Yoo, Dong Eun ^c   Yoo, Kyoung Jong ^b   Kim, Jin Su ^b   Lee, Jun ^b   Lee, Jeong Oen ^a   Choi, Seon Jin ^a   Yoon, Gun Wook ^a   Lee, Dong Wook ^c   Lee, Gi Seong ^c   Hwang, Hae Chul ^c   Yoon, Jun Bo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b LG Innotek Components and Materials RandD Center   (South Korea)

^c National Nano Fab Center (NNFC)   (South Korea)

Author keywords

Nanomaterial; nanopatterning; nanowire; spacer lithography; top down; wire grid polarizer

Indexed keywords

NANOMATERIAL; NANOPATTERNING; SPACER LITHOGRAPHY; TOPDOWN; WIRE GRID POLARIZERS;

ASPECT RATIO; FERROELECTRIC MATERIALS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PRODUCTIVITY;

NANOWIRES;

EID: 84884267687     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl400209n     Document Type: Article

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