Top-down contact lithography fabrication of a TiO2 nanowire array over a SiO2 mesa

Nanotechnology

Volumn 17, Issue 15, 2006, Pages 3761-3767

  Francioso, L ^a   Siciliano, P ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTRIC CONDUCTIVITY; PHOTOLITHOGRAPHY; SILICA; SOL-GELS; TITANIUM OXIDES; ULTRAVIOLET RADIATION;

ETOH PULSES; NANOWIRES; TOP DOWN CONTACT LITHOGRAPHY; ULTRAVIOLET (UV) PHOTOLITHOGRAPHIC PROCESS;

NANOTECHNOLOGY;

EID: 33748911671     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/15/025     Document Type: Article

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