Graphene as discharge layer for electron beam lithography on insulating substrate

Applied Physics Letters

Volumn 103, Issue 11, 2013, Pages

  Liu, Junku ^a   Li, Qunqing ^a   Ren, Mengxin ^a,b   Zhang, Lihui ^a   Chen, Mo ^a   Fan, Shoushan ^a  

^a TSINGHUA UNIVERSITY   (China)

^b NANKAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX NANOSTRUCTURES; CONDUCTIVE LAYER; ELECTRICALLY CONDUCTIVE; INSULATING SUBSTRATES; PATTERN PLACEMENT ERRORS; PROXIMITY EFFECTS; QUARTZ SUBSTRATE; TRANSPARENT GRAPHENE;

ELECTRON BEAM LITHOGRAPHY; GRAPHENE; INSULATION; QUARTZ;

SUBSTRATES;

EID: 84884258502     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4819732     Document Type: Article

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