The effect of thin metal overlayers on the electron beam exposure of polymethyl methacrylate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2300-2305

  Samantaray, C B ^a   Hastings, J T ^a  

^a UNIVERSITY OF KENTUCKY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM ENERGIES; CHARGE REDUCTIONS; CONDUCTIVE POLYMERS; CU LAYERS; DIRECT WRITINGS; METAL LAYERS; MONTE CARLO SIMULATIONS; POINT SPREAD FUNCTIONS; SINGLE PIXELS; THIN METAL COATINGS; THIN METALS;

CHROMIUM; COATINGS; CONDUCTING POLYMERS; COPPER; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON GUNS; ELECTRONS; METAL RECOVERY; METALLIC FILMS; MONTE CARLO METHODS; OPTICAL TRANSFER FUNCTION; PARTICLE BEAMS; PHOTORESISTS; PIXELS; POLYMERS; PROTECTIVE COATINGS;

METALS;

EID: 57249094096     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3021397     Document Type: Article

References (13)

1. SPIE Handbook of Microlithography, Micromaching, and Microfabrication, edited by, P. Rai Choudhury, (SPIE, Bellingham, WA, 1997), Vol. 1, pp. 139.
2. K. M. Satyalakshmi, A. Olkhovets, M. G. Metzler, C. K. Harnett, D. M. Tanenbaum, and H. G. Craighead, J. Vac. Sci. Technol. B 18, 3122 (2000).
3. W. Liu, J. Ingino, and R. F. W. Pease, J. Vac. Sci. Technol. B 13, 1979 (1995).
4. M. Bai, W. D. Meisburger, and R. F. W. Pease, J. Vac. Sci. Technol. B 21, 106 (2003).
5. M. Bai, R. F. W. Pease, C. Tanasa, M. A. McCord, D. S. Pickard, and D. Meisburger, J. Vac. Sci. Technol. B 17, 2893 (1999).
6. F. Zhang, H. I. Smith, and J. F. Dai, J. Vac. Sci. Technol. B 23, 3061 (2005).
7. J. T. Hastings, F. Zhang, and H. I. Smith, J. Vac. Sci. Technol. B 21, 2650 (2003).
8. Y. H. Lee, R. Browning, N. Maluf, G. Owen, and R. F. W. Pease, J. Vac. Sci. Technol. B 10, 3094 (1992).
9. K. W. Rhee, D. I. Ma, M. C. Peckerar, R. A. Ghanbari, and H. I. Smith, J. Vac. Sci. Technol. B 10, 3062 (1992).
10. K. Murata, D. F. Kyser, and C. H. Ting, J. Appl. Phys. 52, 4396 (1981).
11. CRC Handbook of Chemistry and Physics, 88th ed., edited by, D. R. Lide, (internet version) (CRC Press/Taylor and Francis, Boca Raton, FL, 2008).
12. D. C. Joy, Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford University Press, New York, 1995).
13. S. A. Rishton and D. P. Kern, J. Vac. Sci. Technol. B 5, 135 (1987).