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Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography

(4) Muhammad, Mustafa a,b Buswell, Steven C c Dew, Steven K a Stepanova, Maria a,b

a UNIVERSITY OF ALBERTA (Canada)

b NATIONAL RESEARCH COUNCIL CANADA (Canada)

c Applied Nanotools Inc ^* (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CONDUCTING POLYMERS; DIELECTRIC MATERIALS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FUSED SILICA; MOLDS; NANOTECHNOLOGY; POLYMER FILMS; POLYMETHYL METHACRYLATES;

GLASS SUBSTRATES; HIGH-THROUGHPUT METHOD; INSULATING SURFACES; INSULATOR SUBSTRATES; INTEGRATED CIRCUIT FABRICATION; NANO-SCALE PATTERNS; NANO-SIZED PATTERNS; STEP-AND-FLASH IMPRINT LITHOGRAPHY;

SUBSTRATES;

EID: 84255184104 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3636367 Document Type: Article

Times cited : (23)

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