Charge dissipation layer based on conductive polymer for electron-beam patterning of bulk zinc oxide

Electronics Letters

Volumn 46, Issue 14, 2010, Pages 1025-1027

  Dylewicz, R ^a   Lis, S ^b   De La Rue, R M ^a   Rahman, F ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE DISSIPATION; CONDUCTIVE POLYMER; ELECTRON BEAM PATTERNING; HIGH-ENERGY ELECTRON; HIGH-RESOLUTION PATTERNS; HSQ RESIST; HYDROGEN SILSESQUIOXANE; POLY-THIOPHENE; PROCESSING METHOD; ZNO;

CONDUCTIVE PLASTICS; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; POLYMERS; ZINC;

ZINC OXIDE;

EID: 77954586089     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el.2010.1282     Document Type: Article

References (7)

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