SCOPUS 정보 검색 플랫폼

Volumn 1, Issue 34, 2013, Pages 9942-9946

Developing controllable anisotropic wet etching to achieve silicon nanorods, nanopencils and nanocones for efficient photon trapping

(10) Lin, Hao a,b Cheung, Ho Yuen a Xiu, Fei a Wang, Fengyun a Yip, Senpo a Han, Ning a Hung, Takfu a Zhou, Jun b Ho, Johnny C a Wong, Chun Yuen a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b NINGBO UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANOCLUSTERS; ANISOTROPIC WET ETCHING; ETCHING MECHANISM; GEOMETRICAL MORPHOLOGY; OPTICAL REFLECTANCE; RELATIVE CONCENTRATION; SI NANOSTRUCTURES; SINGLE-CRYSTALLINE NANORODS;

ASPECT RATIO; NANORODS; PHOTONS;

ANISOTROPY;

EID: 84881437977 PISSN: 20507488 EISSN: 20507496 Source Type: Journal
DOI: 10.1039/c3ta11889d Document Type: Article

Times cited : (80)

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