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Volumn 116, Issue 1, 2002, Pages 275-280
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The mechanism of HF/H2O chemical etching of SiO2
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Author keywords
[No Author keywords available]
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Indexed keywords
CATALYSIS;
CHEMICAL ACTIVATION;
ETCHING;
FLUORINE COMPOUNDS;
HYDROLYSIS;
PASSIVATION;
QUANTUM THEORY;
SURFACE CLEANING;
HYDROGEN FLUORIDE;
QUANTUM CHEMISTRY;
SILICA;
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EID: 0036143587
PISSN: 00219606
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1420729 Document Type: Article |
Times cited : (108)
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References (32)
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