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Volumn 116, Issue 1, 2002, Pages 275-280

The mechanism of HF/H2O chemical etching of SiO2

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL ACTIVATION; ETCHING; FLUORINE COMPOUNDS; HYDROLYSIS; PASSIVATION; QUANTUM THEORY; SURFACE CLEANING;

EID: 0036143587     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1420729     Document Type: Article
Times cited : (108)

References (32)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.