-
1
-
-
79955830704
-
Resistance switching for RRAM applications
-
May
-
F. T. Chen et al., "Resistance switching for RRAM applications.," Sci. China Inf. Sci., Vol. 54, pp. 1073-1086, May 2011.
-
(2011)
Sci. China Inf. Sci.
, vol.54
, pp. 1073-1086
-
-
Chen, F.T.1
-
2
-
-
67650102619
-
Redox-based resistive switching memories - Nanoionic mechanisms, prospects, and challenges
-
R. Waser, R. Dittman, G. Staikov, and K. Szot, "Redox-based resistive switching memories - Nanoionic mechanisms, prospects, and challenges," Adv. Mat., Vol. 21, pp. 2632-2663, 2009.
-
(2009)
Adv. Mat.
, vol.21
, pp. 2632-2663
-
-
Waser, R.1
Dittman, R.2
Staikov, G.3
Szot, K.4
-
3
-
-
77957922168
-
Ultra-low power al2o3-based RRAM with 1 μA RESET current
-
Y. Wu, B. Lee, and H.-S. P. Wong, "Ultra-low power Al2O3-based RRAM with 1 μA RESET current," Intl. Symp. VLSI Tech. - Sys. and App., pp. 136-137, 2010.
-
(2010)
Intl. Symp. VLSI Tech. - Sys. and App.
, pp. 136-137
-
-
Wu, Y.1
Lee, B.2
Wong, H.-S.P.3
-
4
-
-
80052683906
-
Forming-free nitrogen-doped AlOx RRAM with sub-μA programming current
-
W. Kim et al., "Forming-free nitrogen-doped AlOx RRAM with sub-μA programming current," Symp. on VLSI Tech. Dig. Tech. Papers, pp. 22-23, 2011.
-
(2011)
Symp. on VLSI Tech. Dig. Tech. Papers
, pp. 22-23
-
-
Kim, W.1
-
5
-
-
84862778084
-
Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
-
May
-
N. Raghavan, K. L. Pey, X. Wu, W. Liu, and M. Bosman, "Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching," IEEE Elec. Dev. Lett., Vol. 33, pp. 712-714, May 2012.
-
(2012)
IEEE Elec. Dev. Lett.
, vol.33
, pp. 712-714
-
-
Raghavan, N.1
Pey, K.L.2
Wu, X.3
Liu, W.4
Bosman, M.5
-
6
-
-
79955715103
-
Evidence and solution of over-RESET problem for HfOx based resistive memory with sub-ns switching speed and high endurance
-
H. Y. Lee et al., "Evidence and solution of over-RESET problem for HfOx based resistive memory with sub-ns switching speed and high endurance," IEDM Dig. Tech. Papers, pp. 460-463, 2010.
-
(2010)
IEDM Dig. Tech. Papers
, pp. 460-463
-
-
Lee, H.Y.1
-
7
-
-
70449393681
-
A 5ns fast write multi-level non-volatile 1K bits RRAM memory with advance write scheme
-
S-S. Sheu et al., "A 5ns fast write multi-level non-volatile 1K bits RRAM memory with advance write scheme," Symp. on VLSI Tech. Dig. Papers, pp. 82-83, 2009.
-
(2009)
Symp. on VLSI Tech. Dig. Papers
, pp. 82-83
-
-
Sheu, S.-S.1
-
8
-
-
84878805103
-
Controlling uniformity of RRAM characteristics through the forming process
-
A. Kalanatarian et al., "Controlling uniformity of RRAM characteristics through the forming process," Intl. Rel. Phys. Symposium, 2012.
-
(2012)
Intl. Rel. Phys. Symposium
-
-
Kalanatarian, A.1
-
9
-
-
84855306489
-
Metal oxide resistive memory switching mechanism based on conductive filament properties
-
G. Bersurker et al., "Metal oxide resistive memory switching mechanism based on conductive filament properties," Appl. Phys. Lett., Vol. 110, 124518, 2011.
-
(2011)
Appl. Phys. Lett.
, vol.110
, pp. 124518
-
-
Bersurker, G.1
-
10
-
-
57049147415
-
The investigation of capture/emission mechanism in high-k gate dielectric soft breakdown by gate current random telegraph noise approach
-
S. S. Chung and C. M. Chang, "The investigation of capture/emission mechanism in high-k gate dielectric soft breakdown by gate current random telegraph noise approach," Appl. Phys. Lett., Vol. 93, 213502, 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 213502
-
-
Chung, S.S.1
Chang, C.M.2
-
11
-
-
77958581292
-
Memory-state dependence of random telegraph noise of ta2o5/TiO2 stack ReRAM
-
November
-
M. Terai, Y. Sakotsubo, Y. Saito, S. Kotsuji, and H. Hada, "Memory-state dependence of random telegraph noise of Ta2O5/TiO2 stack ReRAM," IEEE Elec. Dev. Lett., Vol. 31, pp. 1302-1304, November 2010.
-
(2010)
IEEE Elec. Dev. Lett.
, vol.31
, pp. 1302-1304
-
-
Terai, M.1
Sakotsubo, Y.2
Saito, Y.3
Kotsuji, S.4
Hada, H.5
-
12
-
-
79959925180
-
IC process compatible anodic electrode structures for unipolar HfOx-based RRAM
-
W. S. Chen et al., "IC process compatible anodic electrode structures for unipolar HfOx-based RRAM," Intl. Symp. VLSI Tech. - Sys. and App., 2011.
-
(2011)
Intl. Symp. VLSI Tech. - Sys. and App.
-
-
Chen, W.S.1
-
13
-
-
67949097936
-
Low power and high speed bipolar switching with a thin reactive ti buffer layer in robust HfO2 based RRAM
-
H. Y. Lee et al., "Low power and high speed bipolar switching with a thin reactive Ti buffer layer in robust HfO2 based RRAM," IEDM Dig. Tech. Papers, 2008.
-
(2008)
IEDM Dig. Tech. Papers
-
-
Lee, H.Y.1
-
14
-
-
77957904924
-
Comprehensive study of read disturb immunity and optimal read scheme for high speed HfOx based RRAM with a ti layer
-
H.-Y. Lee et al., "Comprehensive study of read disturb immunity and optimal read scheme for high speed HfOx based RRAM with a Ti layer," Intl. Symp. VLSI Tech. - Sys. and App., pp. 132-133, 2010.
-
(2010)
Intl. Symp. VLSI Tech. - Sys. and App.
, pp. 132-133
-
-
Lee, H.-Y.1
-
15
-
-
77957923056
-
Scalability with silicon nitride encapsulation layer for ti/HfOx pillar RRAM
-
P.-Y. Gu et al., "Scalability with silicon nitride encapsulation layer for Ti/HfOx pillar RRAM, Intl. Symp. VLSI Tech. - Sys. and App., pp. 146-147, 2010.
-
(2010)
Intl. Symp. VLSI Tech. - Sys. and App.
, pp. 146-147
-
-
Gu, P.-Y.1
-
17
-
-
0004342505
-
Finite size corrections to the conductance of ballistic wires
-
November 15
-
A. Garcia-Martin, J. A. Torres, and J. J. Saenz, "Finite size corrections to the conductance of ballistic wires," Phys. Rev. B, Vol. 54, pp. 448-451, November 15, 1996.
-
(1996)
Phys. Rev. B
, vol.54
, pp. 448-451
-
-
Garcia-Martin, A.1
Torres, J.A.2
Saenz, J.J.3
-
18
-
-
13644278163
-
2/Si structure
-
2/Si structure," J. Appl. Phys., Vol. 97, 034506, 2005.
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 034506
-
-
Chiu, F.-C.1
-
19
-
-
77953023010
-
2 MIM structures based on the transmission properties of narrow constrictions
-
June
-
2 MIM structures based on the transmission properties of narrow constrictions," IEEE Elec. Dev. Lett., Vol. 31, pp. 609-611, June 2010.
-
(2010)
IEEE Elec. Dev. Lett.
, vol.31
, pp. 609-611
-
-
Miranda, E.A.1
Walczyk, C.2
Wenger, C.3
Schroeder, T.4
-
20
-
-
78649367980
-
Highly scalable hafnium oxide memory with improvements of resistive distribution and read distube immunity
-
Y. S. Chen et al., "Highly scalable hafnium oxide memory with improvements of resistive distribution and read distube immunity," IEDM Dig. Tech. Papers, pp. 105-108, 2009.
-
(2009)
IEDM Dig. Tech. Papers
, pp. 105-108
-
-
Chen, Y.S.1
-
21
-
-
84875931643
-
2 based RRAM operation voltage scaling for embedded memory
-
in press
-
2 based RRAM operation voltage scaling for embedded memory," CSTIC 2013, in press.
-
(2013)
CSTIC
-
-
Tsai, C.H.1
-
22
-
-
78650360593
-
Evidences of oxygen-mediated resistive-switching mechanism in TiN\HfO2\Pt cells
-
L. Goux et al., "Evidences of oxygen-mediated resistive-switching mechanism in TiN\HfO2\Pt cells," Appl. Phys. Lett., Vol. 97, 243509, 2010.
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 243509
-
-
Goux, L.1
-
23
-
-
84866561026
-
Dynamic 'Hour glass' model for SET and RESET in HfO2 RRAM
-
R. Degraeve et al., "Dynamic 'Hour Glass' model for SET and RESET in HfO2 RRAM," Symp. on VLSI Tech. Dig. Tech. Papers, pp. 75-76, 2012.
-
(2012)
Symp. on VLSI Tech. Dig. Tech. Papers
, pp. 75-76
-
-
Degraeve, R.1
-
24
-
-
84864754722
-
Complementary switching in metal oxides: Toward diode-less crossbar RRAMs
-
F. Nardi, S. Balatti, S. Laurentis, and D. Ielmini, "Complementary switching in metal oxides: toward diode-less crossbar RRAMs," IEDM Dig. Tech. Papers, pp. 709-712, 2011.
-
(2011)
IEDM Dig. Tech. Papers
, pp. 709-712
-
-
Nardi, F.1
Balatti, S.2
Laurentis, S.3
Ielmini, D.4
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