Direct modification of silicon surface by nanosecond laser interference lithography

Applied Surface Science

Volumn 282, Issue , 2013, Pages 67-72

  Wang, Dapeng ^a,b   Wang, Zuobin ^a,b   Zhang, Ziang ^a   Yue, Yong ^a,b   Li, Dayou ^b   Maple, Carsten ^a,b  

^a CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b UNIVERSITY OF BEDFORDSHIRE   (United Kingdom)

Author keywords

Direct modification; Laser interference lithography; Micro and nano structures; Silicon

Indexed keywords

LITHOGRAPHY; NANOSTRUCTURES; SILICON;

DIRECT MODIFICATION; EFFICIENT TECHNOLOGY; EVAPORATION BEHAVIORS; LASER INTERFERENCE LITHOGRAPHY; LASER INTERFERENCE PATTERNS; LASER MODIFICATIONS; QUASI-PERIODIC STRUCTURES; SURFACE ENGINEERING;

PERIODIC STRUCTURES;

EID: 84880948571     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.05.042     Document Type: Article

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