High-rotational symmetry lattices fabricated by Moiré nanolithography

Nano Letters

Volumn 12, Issue 9, 2012, Pages 4948-4952

  Lubin, Steven M ^a   Zhou, Wei ^b   Hryn, Alexander J ^b   Huntington, Mark D ^b   Odom, Teri W ^a,b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

Author keywords

high rotational symmetry lattices; moir patterns; Nanopatterning; quasiperiodic; soft lithography

Indexed keywords

NANO PATTERN; NANO-FABRICATION METHODS; NANOPATTERNING; OFFSET ANGLE; PERIODIC LATTICES; PHOTONIC APPLICATION; QUASI-PERIODIC; QUASI-PERIODIC LATTICES; ROTATIONAL SYMMETRIES; SOFT LITHOGRAPHY; SUB-WAVELENGTH; VISIBLE LIGHT; WAFER-SCALE;

NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

NANOLITHOGRAPHY;

ELASTOMER; NANOMATERIAL;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; PHOTOGRAPHY; ROTATION; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELASTOMERS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; PHOTOGRAPHY; ROTATION; SURFACE PROPERTIES;

EID: 84866324637     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl302535p     Document Type: Article

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