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Volumn 99, Issue , 2014, Pages 160-165

Structural and opto-electrical properties of Cu-Al-O thin films prepared by magnetron sputtering method

Author keywords

Antireflection effect; Band gap; Cu Al O; Optical transmittance; Wettability

Indexed keywords

ANTI-REFLECTION EFFECTS; AS-DEPOSITED FILMS; CU-AL-O; MAGNETRON SPUTTERING METHOD; P-TYPE CONDUCTIVITY; POST ANNEALING TREATMENT; RADIO FREQUENCY MAGNETRON SPUTTERING; STRUCTURAL CHARACTERISTICS;

EID: 84879476733     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2013.05.019     Document Type: Article
Times cited : (30)

References (40)
  • 40
    • 0003868574 scopus 로고
    • Shanghai Scientific and Technical Publishers
    • J.F. Tang, and Q. Zheng Applied film optics 1984 Shanghai Scientific and Technical Publishers
    • (1984) Applied Film Optics
    • Tang, J.F.1    Zheng, Q.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.