Growth conditions of CuAlO2 films - Thermodynamic considerations

Thin Solid Films

Volumn 520, Issue 4, 2011, Pages 1299-1302

  Neumann Spallart, M ^a   Pinto, R ^b  

^a LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT   (France)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

Copper aluminum oxide; Metastable phase; Pulsed laser deposition

Indexed keywords

ALUMINUM OXIDES; AMBIENT CONDITIONS; ANNEALING PARAMETERS; DEPOSITION METHODS; ELECTRICAL CONDUCTIVITY; GROWTH CONDITIONS; HEATING AND COOLING RATES; INTERCONNECTED NETWORK; METASTABLE PHASE; ROOM TEMPERATURE; SAPPHIRE SUBSTRATES;

ANNEALING; CRYSTALLITES; ELECTRIC CONDUCTIVITY; METASTABLE PHASES; PULSED LASER DEPOSITION; SAPPHIRE; THICK FILMS;

PULSED LASERS;

EID: 82755194766     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.162     Document Type: Conference Paper

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