Effect of substrate temperature on the physical properties of dc magnetron sputtered CuAlO2 films

Journal of Alloys and Compounds

Volumn 474, Issue 1-2, 2009, Pages 401-405

  Reddy, A Sivasankar ^a,c   Park, Hyung Ho ^a   Rao, G Mohan ^b   Uthanna, S ^c   Reddy, P Sreedhara ^c  

^a Yonsei University   (South Korea)

^b INDIAN INSTITUTE OF SCIENCE   (India)

^c SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

CuAlO2; Sputtering; Thin films; Transparent conducting oxides

Indexed keywords

ALUMINA; AMORPHOUS FILMS; CARRIER CONCENTRATION; CONDUCTIVE FILMS; COPPER OXIDES; ELECTRIC PROPERTIES; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; MAGNETRONS; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

ALUMINUM OXIDE FILMS; CRYSTALLINITY; CUALO2; DIRECT-CURRENTS; ELECTRICAL PROPERTIES; OPTICAL BAND-GAP; POLY-CRYSTALLINE; REACTIVE MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURES; TRANSPARENT CONDUCTING OXIDES; VARIOUS SUBSTRATES;

OXIDE FILMS;

EID: 61649121590     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.06.107     Document Type: Article

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