Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

Materials Science and Engineering: B

Volumn 85, Issue 2-3, 2001, Pages 131-134

  Wang, Yue ^a   Gong, Hao ^a   Zhu, Furong ^b   Liu, Ling ^a   Huang, Lei ^a   Huan, A C H ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Cu Al O; P type; PE MOCVD; Semiconducting; Transparent

Indexed keywords

AMORPHOUS FILMS; COPPER COMPOUNDS; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; HOT CARRIERS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEEBECK EFFECT; SUBLIMATION; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS;

ALUMINUM ACETYLACETONATE; COPPER ACETYLACETONATE;

SEMICONDUCTING FILMS;

EID: 0035934353     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00545-1     Document Type: Article

References (14)