Enhanced dry etching of silicon with deuterium plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 707-709

  Iwakuro, Hiroaki ^a,c   Kuroda, Tsukasa ^a   Shen, Dian Hong ^b   Lin, Zhangda ^b  

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c Shindengen Electric Manufacturing Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3743117944     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589160     Document Type: Article

References (9)

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