Rectification of EUV-patterned contact holes using directed self-assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8682, Issue , 2013, Pages

  Gronheid, Roel ^a   Singh, Arjun ^a,b   Younkin, Todd R ^c   Rincon Delgadillo, Paulina ^a,b,d   Nealey, Paul ^d   Chan, Boon Teik ^a   Nafus, Kathleen ^e   Negreira, Ainhoa Romo ^e   Somervell, Mark ^e  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c INTEL CORPORATION   (United States)

^d UNIVERSITY OF CHICAGO   (United States)

^e TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

CDU; Chemo epitaxy; Contact hole rectification; Directed self assembly; EUV; Grapho epitaxy

Indexed keywords

CDU; CHEMO-EPITAXY; CONTACT HOLES; DIRECTED SELF-ASSEMBLY; EUV; GRAPHO-EPITAXY;

EPITAXIAL GROWTH;

SELF ASSEMBLY;

EID: 84878402083     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2012667     Document Type: Conference Paper

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