Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Ross, C A ^a   Jung, Y S ^a   Chuang, V P ^a   Son, J G ^a   Gotrik, K W ^a   Mickiewicz, R A ^a   Yang, J K W ^b   Chang, J B ^a   Berggren, K K ^b   Gwyther, J ^c   Manners, I ^c  

^a Massachusetts Institute of Technology   (United States)

^b Dept Electrical Engineering and Computer Science ^*  (United States)

^c UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Block copolymer; nanolithography; pattern transfer; polydimethylsiloxane; polyferrocenylsilane; self assembly; triblock terpolymer

Indexed keywords

PATTERN TRANSFER; PATTERN TRANSFERS; POLYFERROCENYLSILANES; TRIBLOCK TERPOLYMER; TRIBLOCK TERPOLYMERS;

BLOCK COPOLYMERS; COPOLYMERIZATION; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; OXYGEN; POLYSTYRENES; SELF ASSEMBLY; SILICONES;

PLASTIC PRODUCTS;

EID: 77953313247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848502     Document Type: Conference Paper

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35. rd Conference on Magnetism and Magnetic Materials, Nov. 2008, Austin, TX