Directed self-assembly process implementation in a 300mm pilot line environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Liu, Chi Chun ^a   Estrada Raygoza, I Cristina ^a   Abdallah, Jassem ^a   Holmes, Steven ^a   Yin, Yunpeng ^a   Schepis, Anthony ^a   Cicoria, Michael ^b   Hetzer, David ^b   Tsai, Hsinyu ^c   Guilllorn, Michael ^c   Tjio, Melia ^d   Cheng, Joy ^d   Somervell, Mark ^e   Colburn, Matthew ^a  

^a IBM   (United States)

^b TEL TECHNOLOGY CENTER   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d IBM ALMADEN RESEARCH CENTER   (United States)

^e TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

BCP; Block copolymer; Chemical pattern; Directed self assembly; DSA; Process window

Indexed keywords

BCP; CHEMICAL PATTERN; DIRECTED SELF-ASSEMBLY; DSA; PROCESS WINDOW;

BLOCK COPOLYMERS;

SELF ASSEMBLY;

EID: 84878396881     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011610     Document Type: Conference Paper

References (10)

1. J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Friz, S. Holmes, et al., "Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist," ACS Nano, vol. 4, pp. 4815-4823, Aug 2010.
2. R. Ruiz, H. M. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, et al., "Density multiplication and improved lithography by directed block copolymer assembly," Science, vol. 321, pp. 936-939, Aug 2008.
3. C. C. Liu, E. Han, M. S. Onses, C. J. Thode, S. X. Ji, P. Gopalan, et al., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats," Macromolecules, vol. 44, pp. 1876-1885, Apr 2011.
4. M. Somervell, R. Gronheid, J. Hooge, K. Nafus, P. R. Delgadillo, C. Thode, et al., "Comparison of directed self-assembly integrations," 2012, p. 83250G.
5. C. Bencher, H. Yi, J. Zhou, M. Cai, J. Smith, L. Miao, et al., "Directed self-assembly defectivity assessment. Part II," in SPIE Advanced Lithography, 2012, p. 83230N.
6. P. A. R. Delgadillo, R. Gronheid, C. J. Thode, H. P. Wu, Y. Cao, M. Neisser, et al., "Implementation of a chemoepitaxy flow for directed self-assembly on 300-mm wafer processing equipment," Journal of Micro-Nanolithography Mems and Moems, vol. 11, Jul-Sep 2012.
7. R. Gronheid, P. A. R. Delgadillo, T. R. Younkin, I. Pollentier, M. Somervell, J. S. Hooge, et al., "Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern," Journal of Micro-Nanolithography Mems and Moems, vol. 11, Jul-Sep 2012.
8. E. W. Edwards, M. Muller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo, and P. F. Nealey, "Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates," Macromolecules, vol. 40, pp. 90-96, Jan 2007.
9. M. P. Stoykovich, K. C. Daoulas, M. Muller, H. M. Kang, J. J. de Pablo, and P. F. Nealey, "Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films," Macromolecules, vol. 43, pp. 2334-2342, Mar 2010.
10. Y. Kondo, A. Ookouchi, T. Tsuruda, M. Yamamoto, T. Saito, T. Shibata, et al., "The optimizations of resist shrink process using track-based technology," pp. 76390X-76390X-8, 2010.