메뉴 건너뛰기




Volumn 60, Issue 6, 2013, Pages 2015-2021

Accelerated stress test assessment of through-silicon via using RF signals

Author keywords

Failure analysis; radio frequency (RF); thermal cycling; through silicon via (TSV)

Indexed keywords

ACCELERATED STRESS; EARLY FAILURE; RADIO FREQUENCIES; RADIOFREQUENCY SIGNALS; THERMAL CYCLE; THROUGH SILICON VIAS; THROUGH-SILICON VIA; TRANSMISSION CHARACTERISTICS;

EID: 84878119047     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2013.2257791     Document Type: Article
Times cited : (21)

References (16)
  • 1
    • 35348920031 scopus 로고    scopus 로고
    • Analysis of the induced stresses in silicon during thermcompression Cu-Cu bonding of Cu-through-vias in 3D-SIC architecture
    • DOI 10.1109/ECTC.2007.373805, 4249891, Proceedings - 57th Electronic Components and Technology Conference 2007, ECTC '07
    • C. Okoro, M. Gonzalez, B. Vandevelde, B. Swinnen, G. Eneman, S. Stoukatch, E. Beyne, and D. Vandepitte, "Analysis of the induced stresses in silicon during Thermocompression Cu-Cu bonding of Cuthrough-vias in 3D-SIC architecture," in Proc. 57th Electron. Compon. Technol. Conf., Jun. 2007, pp. 249-255. (Pubitemid 47577038)
    • (2007) Proceedings - Electronic Components and Technology Conference , pp. 249-255
    • Okoro, C.1    Gonzalez, M.2    Vandevelde, B.3    Swinen, B.4    Eneman, G.5    Stoukatch, S.6    Beyne, E.7    Vandepitte, D.8
  • 3
    • 60949091043 scopus 로고    scopus 로고
    • Filling of microvia with an aspect ratio of 5 by copper electrodeposition
    • O. Luhn, C. Van Hoof, W. Ruythooren, and J.-P. Celis, "Filling of microvia with an aspect ratio of 5 by copper electrodeposition," Electrochim. Acta, vol. 54, no. 9, pp. 2504-2508, 2009.
    • (2009) Electrochim. Acta , vol.54 , Issue.9 , pp. 2504-2508
    • Luhn, O.1    Van Hoof, C.2    Ruythooren, W.3    Celis, J.-P.4
  • 6
    • 50949109688 scopus 로고    scopus 로고
    • Extraction of the appropriate material property for realistic modeling of through-silicon-vias using ?-Raman spectroscopy
    • San Francisco, CA, USA May
    • C. Okoro, Y. Yang, B. Vandevelde, B. Swinnen, D. Vandepitte, B. Verlinden, and I. De Wolf, "Extraction of the appropriate material property for realistic modeling of through-silicon-vias using ?-Raman spectroscopy," in Proc. Int. Interconnect Technol. Conf., San Francisco, CA, USA, May 2008, pp. 16-18.
    • (2008) Proc. Int. Interconnect Technol. Conf , pp. 16-18
    • Okoro, C.1    Yang, Y.2    Vandevelde, B.3    Swinnen, B.4    Vandepitte, D.5    Verlinden, B.6    De Wolf, I.7
  • 10
    • 51349118339 scopus 로고    scopus 로고
    • Detection of solder joint degradation using RF impedance analysis
    • Lake Buena Vista, FL, USA May
    • D. Kwon, M. H. Azarian, and M. G. Pecht, "Detection of solder joint degradation using RF impedance analysis," in Proc. 58th Electron. Compon. Technol. Conf., Lake Buena Vista, FL, USA, May 2008, pp. 606-610.
    • (2008) Proc. 58th Electron. Compon. Technol. Conf , pp. 606-610
    • Kwon, D.1    Azarian, M.H.2    Pecht, M.G.3
  • 11
    • 0033908460 scopus 로고    scopus 로고
    • Novel fast technique for detecting voiding damage in IC interconnects
    • DOI 10.1016/S0026-2714(99)00152-3
    • S. Foley, L. Floyd, and A. Mathewson, "A novel fast technique for detecting voiding damage in IC interconnects," Microelectron. Rel., vol. 40, no. 1, pp. 87-97, 2000. (Pubitemid 30535669)
    • (2000) Microelectronics Reliability , vol.40 , Issue.1 , pp. 87-97
    • Foley, S.1    Floyd, L.2    Mathewson, A.3
  • 13
    • 80052032494 scopus 로고    scopus 로고
    • High-speed design and broadband modeling of through-strata-vias (TSVs) in 3D integration
    • Feb.
    • Z. Xu and J.-Q. Lu, "High-speed design and broadband modeling of through-strata-vias (TSVs) in 3D integration," IEEE Trans. Compon., Packag. Manuf. Technol., vol. 1, no. 2, pp. 154-162, Feb. 2011.
    • (2011) IEEE Trans. Compon., Packag. Manuf. Technol. , vol.1 , Issue.2 , pp. 154-162
    • Xu, Z.1    Lu, J.-Q.2
  • 15
    • 84878158612 scopus 로고    scopus 로고
    • Maximum RF input power of SiGe: C bipolar transistor BFR740L3RH
    • Neubiberg, Germany, Tech. Rep. TR151 Aug.
    • "Maximum RF input power of SiGe: C bipolar transistor BFR740L3RH," Infineon Technologies AG, Neubiberg, Germany, Tech. Rep. TR151, Aug. 2009, pp. 1-7.
    • (2009) Infineon Technologies AG , pp. 1-7
  • 16
    • 0038974363 scopus 로고    scopus 로고
    • Void formation by thermal stress concentration at twin interfaces in Cu thin films
    • DOI 10.1063/1.1399021
    • A. Sekiguchi, J. Koike, S. Kamiya, M. Saka, and K. Maruyama, "Void formation by thermal stress concentration at twin interfaces in Cu thin films," Appl. Phys. Lett., vol. 79, no. 9, pp. 1264-1266, 2001. (Pubitemid 33599568)
    • (2001) Applied Physics Letters , vol.79 , Issue.9 , pp. 1264-1266
    • Sekiguchi, A.1    Koike, J.2    Kamiya, S.3    Saka, M.4    Maruyama, K.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.