Characterizations and process parameters of titanium dioxide thin film by RF sputtering

Journal of Nano Research

Volumn 22, Issue , 2013, Pages 9-21

  Yang, Chii Rong ^a   Teng, Tun Ping ^a   Yeh, Yun Yu ^b  

^a NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Oxidation; Photocatalytic performance; Thin films; Titanium dioxide

Indexed keywords

FLOW RATE; MAGNETRON SPUTTERING; OXIDATION; OXIDES; OXYGEN; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

DEPOSITION TIME; EMPIRICAL FORMULAS; GLASS SUBSTRATES; OXIDATION PROCESS; PHOTOCATALYTIC PERFORMANCE; PROCESS PARAMETERS; RF-MAGNETRON SPUTTERING; TITANIUM DIOXIDE THIN FILM;

VAPOR DEPOSITION;

EID: 84878048739     PISSN: 16625250     EISSN: 16619897     Source Type: Journal    
DOI: 10.4028/www.scientific.net/JNanoR.22.9     Document Type: Article

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