Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3436-3442

  Xiong, Junjie ^a   Das, Sachindra Nath ^a   Kim, Sungyeon ^a   Lim, Jinhyong ^a   Choi, Hyun ^a   Myoung, Jae Min ^a  

^a Yonsei University   (South Korea)

Author keywords

Oxygen flow ratio; Photo induced hydrophilic; Reactive RF magnetron sputtering; Self cleaning; TiO2

Indexed keywords

OXYGEN FLOW RATIOS; PHOTO-INDUCED; RF-MAGNETRON SPUTTERING; SELF CLEANING; TIO;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; FIELD EMISSION; FIELD EMISSION MICROSCOPES; HYDROPHILICITY; MAGNETRON SPUTTERING; OXIDE MINERALS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYGEN VACANCIES;

EID: 77953718012     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.001     Document Type: Article

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