Investigation into the effects of deposition parameters on TiO2 photocatalyst thin films by rf magnetron sputtering

Superlattices and Microstructures

Volumn 46, Issue 3, 2009, Pages 461-468

  Chen, C C ^a   Yang, W J ^a   Hsu, C Y ^a  

^a LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Deposition rates; Hydrophilicity; Methylene blue; O2 (Ar+O2) flow rate ratios; TiO2 photocatalyst films

Indexed keywords

ABSORBANCES; ANATASE PHASE; DEPOSITION PARAMETERS; EXPERIMENTAL STUDIES; FLOW-RATE; GLASS SUBSTRATES; METHYLENE BLUE; O2/(AR+O2) FLOW-RATE RATIOS; ORTHOGONAL ARRAY; PERFORMANCE CHARACTERISTICS; PHOTO-INDUCED DECOMPOSITION; PHOTOINDUCED HYDROPHILICITY; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF POWER; RF-MAGNETRON SPUTTERING; SPUTTERING PRESSURES; SUBSTRATE TEMPERATURE; THIN-FILM DEPOSITIONS; TIO; TIO2 PHOTOCATALYST FILMS; UV ILLUMINATIONS; UV IRRADIATION; UV-LIGHT ILLUMINATION; WATER CONTACT ANGLE;

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITION RATES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROPHILICITY; MAGNETRON SPUTTERING; MAGNETRONS; PHOTOCATALYSIS; REGRESSION ANALYSIS; SIGNAL TO NOISE RATIO; SUBSTRATES; TAGUCHI METHODS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

DEPOSITION;

EID: 68349160828     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2009.05.007     Document Type: Article

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