Electrostatic sol-spray deposition (ESSD) and characterization of nanostructured TiO2 thin films

Thin Solid Films

Volumn 342, Issue 1, 1999, Pages 35-41

  Chen, C H ^a   Kelder, E M ^a   Schoonman, J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DEPOSITION; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ELECTROSTATIC SOL-SPRAY DEPOSITION (ESSD); PHASE STABILIZATION EFFECTS;

METALLIC FILMS;

EID: 0032688003     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01160-2     Document Type: Article

References (57)

1. Chen J.P., Yang R.T. Chem. Eng. Comm. 152:1996;161.
2. Lin S.D., Song C. Catalysis Today. 31:1996;93.
3. Kwant G.J., Prins W., van Swaaij W.P.M. Chem. Eng. Sci. 49:1994;4299.
4. Zhou L., Akgeman A. Ind. Eng. Chem. Res. 34:1995;1588.
5. Kantcheva M.M., Hadjiivanov K.I., Davydov A.A., Budneva A.A. Appl. Surf. Sci. 55:1992;49.
6. Heung Y.H., Anderson M.A. J. Environ. Eng. 122:1996;217.
7. Chen P.H., Chen C.Y., Jeng C.H. Water Supply. 13:1995;29.
8. Watts J.R., Kong S., Lee W. J. Environ. Eng. 121:1995;730.
9. Gupta H., Tanaka S. Water Sci. Technol. 31:1995;47.
10. Pham H.N., McDowell T., Wilkins E. J. Environm. Sci. Health. 30:1995;627.
11. O B. rsquo;Regan, M. Grätzel. Nature. 353:1991;737.
12. Enea O., Moser J., Grätzel M. J. Elctroanal. Chem. 259:1989;59.
13. Hagfeldt A., Didriksson B., Palmqvist T., Lindstrom H., Sodergren S., Rensmo H., Lindquist S.E. Solar Energy Mater. Solar Cells. 31:1994;481.
14. Cao F., Oskam G., Searson P.C. J. Phys. Chem. 99:1995;17071.
15. Boschloo G.K., Goossens A. J. Phys. Chem. 100:1996;19489.
16. Boschloo G.K., Goossens A., Schoonman J. J. Electrochem. Soc. 144:1997;1311.
17. Cantao M.P., Cisneros J.I., Torresi R.M. Thin Solid Films. 259:1995;70.
18. Huang S.Y., Kavan L., Exnar I., Grätzel M. J. Electrochem. Soc. 142:1995;L142.
19. Gutarra A., Azens A., Stjema B., Granqvist C.G. Appl. Phys. Lett. 64:1994;1604.
20. Rausch N., Burte E.P. J. Electrochem. Soc. 140:1993;145.
21. Terpstra M. Microelectron. J. 23:1992;418.
22. Akbar S.A., Wang C.C. Electrochem. Soc. Interface. 5:1996;41.
23. Vandrish G. Key Eng. Mater. 122:1996;185.
24. Ferroni M., Guidi V., Martinelli G., Faglia G., Nelli P., Sberveglier G. Nanostructured Mater. 7:1996;709.
25. Adams R. Eur. Coat. J. 6:1996;395.
26. Chilcott P.A.D., Stansfield J. Eur. Coat. J. 6:1996;400.
27. Sproul W.D., Graham M.E., Wong M.S., Rudnik P.J. Surf. Coat. Technol. 89:1997;10.
28. Narasimha R.K., Murthy M.A., Mohan S. Thin Solid Films. 176:1989;181.
29. Van de Krol R., Goossens A., Schoonman J. Mater. Res. Soc. Symp. Proc. 448:1997;309.
30. Zhang Q., Griffin G.L. Thin Solid Films. 263:1995;65.
31. Boschloo G.K., Goossens A., Schoonman J. J. Electrochem. Soc. 144:1997;1311.
32. Dixon B.G., Walsh M.A., Phillips P.G., Morris R.S. J. Mater. Res. 10:1995;2626.
33. Xu W.W., Kershaw R., Dwight K., Wold A. Mater. Res. Bulletin. 25:1990;1385.
34. van Zomeren A.A., Kelder E.M., Marijnissen J.C.M., Schoonman J. J. Aerosol Sci. 25:1994;1229.
35. Kelder E.M., Nijs O.C.J., Schoonman J. Solid State Ionics. 68:1994;5.
36. Chen C.H., Buysman A.A.J., Kelder E.M., Schoonman J. Solid State Ionics. 80:1995;1.
37. Chen C.H., Kelder E.M., Schoonman J. J. Mater. Sci. 31:1996;5437.
38. Chen C.H., Kelder E.M., Jak M.J.G., Schoonman J. Solid State Ionics. 86:1996;1301.
39. Chen C.H., Kelder E.M., van der Put P.J.J.M., Schoonman J. J. Mater. Chem. 6:1996;765.
40. Chen C.H., Nord-Varhaug K., Schoonman J. J. Mater. Synthesis Processing. 4:1996;189.
41. C.H. Chen, E.M. Kelder, P.J.J.M. van der Put, J. Schoonman, in: W.A. Adams, B. Scrosati, A.R. Landgrebe (Eds.), Proc. Symp. On Exploratory Research and Development of Batteries for Electric and Hybrid Vehicles, PV96-14, pp. 43.
42. Chen C.H., Kelder E.M., Schoonman J. J. Power Sources. 68:1997;377.
43. Lakeman C.D.E., Payne D.A. Mater. Chem. Phys. 38:1994;305.
44. Komarneini S. J. Sol-Gel Sci. Technol. 6:1996;127.
45. Spiccia L., Watkins I.D., West B.O. Mater. Proc. Mater. Forum. 20:1996;171.
46. LeDuc C.A., Campbell J.M., Rossin J.A. Ind. Eng. Chem. Res. 35:1996;2473.
47. Cheng J.J., Wang D.W. J. Non-Cryst. Solids. 100:1988;288.
48. Lin Y.S., Chang C.H., Gopalan R. Ind. Eng. Chem. Res. 33:1994;860.
49. Kumar K.N.P. Appl. Catal. A General. 119:1994;163.
50. Rodriguez-Talavera R., Vargas S., Arroyo-Murillo R., Montiel-Campos R., Haro-Poniatowski E. J. Mater. Res. 12:1997;439.
51. Kenevey K., Morris M.A., Cunningham J., Ferrand G. Key Eng. Mater. 118:1996;303.
52. Almeida R.M., Christensen E.E. J. Sol-Gel Sci. Technol. 8:1997;409.
53. D.R. Lide, H.P.R. Frederikse, CRC Handbook of Chemistry and Physics, 75th Ed., CRC Press, London, 1994.
54. Shannon R.D., Pask J.A. J. Am. Ceram. Soc. 48:1965;391.
55. H.P. Klug, L.E. Alexander, X-Ray Diffraction Procedures, Wiley, New York, 1954, Chapter 9.
56. S.M. Sze, Physics of Semiconductor Devices, 2nd Ed., Wiley, New York, 1981, Chapter 1.
57. Aoki A., Nogami G. J. Electrochem. Soc. 143:1996;L191.