High rate sputter deposition of TiO2 from TiO2-x target

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 57-60

  Ohsaki, Hisashi ^a   Tachibana, Yuko ^a   Hayashi, Atsushi ^a   Mitsui, Akira ^a   Hayashi, Yasuo ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Sputtering; Titanium oxide

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; ION IMPLANTATION; MAGNETRON SPUTTERING; MONTE CARLO METHODS; OPACITY; OPTICAL COATINGS; PLASMA SPRAYING; REFRACTIVE INDEX; SPUTTER DEPOSITION; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH RATE DEPOSITION EFFICIENCY; HIGH RATE SPUTTER DEPOSITION;

TITANIUM OXIDES;

EID: 0033170278     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00207-2     Document Type: Article

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