Efficient parametric excitation of silicon-on-insulator microcantilever beams by fringing electrostatic fields

Journal of Applied Physics

Volumn 113, Issue 16, 2013, Pages

  Linzon, Yoav ^a   Ilic, Bojan ^b   Lulinsky, Stella ^c   Krylov, Slava ^c  

^a ORT BRAUDE COLLEGE   (Israel)

^b Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

^c TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM CHARACTERISTICS; CO-PLANAR ELECTRODES; DEEP REACTIVE ION ETCHING; GALERKIN DECOMPOSITION; LASER DOPPLER VIBROMETERS; MICROCANTILEVER BEAMS; MICROMECHANICAL CANTILEVERS; PARAMETRIC EXCITATIONS;

PHYSICAL PROPERTIES; PHYSICS;

STIFFNESS;

EID: 84877301721     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4802680     Document Type: Article

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