Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography

Applied Surface Science

Volumn 272, Issue , 2013, Pages 13-18

  Di Lazzaro, Paolo ^a   Bollanti, Sarah ^a   Flora, Francesco ^a   Mezi, Luca ^a   Murra, Daniele ^a   Torre, Amalia ^a  

^a ENEA   (Italy)

Author keywords

Debris mitigation systems; Excimer lasers; Extreme ultraviolet lithography; Laser plasma sources

Indexed keywords

DEBRIS; EXCIMER LASERS; EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; PLASMA INTERACTIONS; PLASMA SOURCES; PULSED LASERS; ULTRAVIOLET LASERS;

DEBRIS CHARACTERISTICS; DEBRIS MITIGATION; EXTREME ULTRAVIOLETS; LASER-PLASMA SOURCE; MICRO-EXPOSURE TOOL; OPERATING RESULTS; PROJECTION LITHOGRAPHY; REDUCTION FACTOR;

LASER PRODUCED PLASMAS;

EID: 84876034203     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.03.155     Document Type: Conference Paper

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