Laser-plasma-source debris-related investigations: An aspect of the ENEA micro-exposure tool

Applied Physics B: Lasers and Optics

Volumn 96, Issue 2-3, 2009, Pages 479-490

  Bollanti, S ^a   Di Lazzaro, P ^a   Flora, F ^a   Mezi, L ^a   Murra, D ^a   Torre, A ^a  

^a ENEA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL ISSUES; DEBRIS MITIGATION; EXTREME ULTRAVIOLET PROJECTION LITHOGRAPHY; GLASS SLIDES; LASER PLASMA; MICRO-EXPOSURE TOOL; MITIGATION SYSTEMS; RESEARCH CENTER;

EXPOSURE METERS; LASER PRODUCED PLASMAS; PHOTOLITHOGRAPHY; PLASMA INTERACTIONS;

DEBRIS;

EID: 67650979229     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-009-3583-z     Document Type: Article

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