Krypton as filter for ions, debris and useless radiation in EUV projection lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4504, Issue , 2001, Pages 77-86

  Flora, Francesco ^a   Mezi, Luca ^a   Bollanti, Sarah ^a   Bonfigli, Francesca ^a   Di Lazzaro, Paolo ^a   Letardi, Tommaso ^a   Zheng, Chengen ^a  

^a ENEA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; KRYPTON; LASER PRODUCED PLASMAS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0035762434     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448452     Document Type: Conference Paper

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