메뉴 건너뛰기




Volumn 49, Issue 3, 2013, Pages 88-94

Subsurface damage distribution in silicon wafers ground with wafer rotation grinding method

Author keywords

Diamond wheel; Grinding; Silicon wafers; Subsurface damage

Indexed keywords

DEVICE WAFERS; DIAMOND WHEEL; INTEGRATED CIRCUIT MANUFACTURING; RADIAL LOCATIONS; SUB-SURFACE DAMAGE; ULTRAPRECISION GRINDING; WAFER BOW; WAFER ROTATIONS;

EID: 84875331268     PISSN: 05776686     EISSN: None     Source Type: Journal    
DOI: 10.3901/JME.2013.03.088     Document Type: Article
Times cited : (19)

References (18)
  • 1
    • 0037395696 scopus 로고    scopus 로고
    • Study of damage and stress induced by backgrinding in Si wafers
    • CHEN Jian, WOLF I D. Study of damage and stress induced by backgrinding in Si wafers [J]. Semiconductor Science and Technology, 2003, 18(4): 261-268.
    • (2003) Semiconductor Science and Technology , vol.18 , Issue.4 , pp. 261-268
    • Chen, J.1    Wolf, I.D.2
  • 2
    • 33746548481 scopus 로고    scopus 로고
    • Mechanical properties and size effects of single crystal silicon
    • HAN Guangping, LIU Kai, WANG Xiuhong. Mechanical properties and size effects of single crystal silicon [J]. Chinese Journal of Mechanical Engineering, 2006, 19(2): 290-293.
    • (2006) Chinese Journal of Mechanical Engineering , vol.19 , Issue.2 , pp. 290-293
    • Han, G.1    Liu, K.2    Wang, X.3
  • 4
    • 84990215599 scopus 로고    scopus 로고
    • Machining mechanism and technology of grinding-based flattening of large size silicon wafers
    • GUO Dongming, KANG Renke, JIN Zhuji, et al. Machining mechanism and technology of grinding-based flattening of large size silicon wafers [J]. Digital Manufacture Science, 2007, 5(4): 1-32.
    • (2007) Digital Manufacture Science , vol.5 , Issue.4 , pp. 1-32
    • Guo, D.1    Kang, R.2    Jin, Z.3
  • 5
    • 78049301699 scopus 로고    scopus 로고
    • Ultra-precision grinding technology and grinder of silicon wafers
    • ZHU Xianglong, KANG Renke, DONG Zhigang, et al. Ultra-precision grinding technology and grinder of silicon wafers [J]. China Mechanical Engineering, 2010, 21(18): 2156-2164.
    • (2010) China Mechanical Engineering , vol.21 , Issue.18 , pp. 2156-2164
    • Zhu, X.1    Kang, R.2    Dong, Z.3
  • 6
    • 78650963402 scopus 로고    scopus 로고
    • Study on grinding-based flattening theory and process technology for large-sized silicon wafer
    • Dalian: Dalian University of Technology
    • TIAN Yebing. Study on grinding-based flattening theory and process technology for large-sized silicon wafer [D]. Dalian: Dalian University of Technology, 2007.
    • (2007)
    • Tian, Y.1
  • 7
    • 1942443786 scopus 로고    scopus 로고
    • Future development of wafer planarization technology in ULSI fabrication
    • GUO Dongming, KANG Renke, SU Jianxiu, et al. Future development of wafer planarization technology in ULSI fabrication [J]. Chinese Journal of Mechanical Engineering, 2003, 39(10): 100-105.
    • (2003) Chinese Journal of Mechanical Engineering , vol.39 , Issue.10 , pp. 100-105
    • Guo, D.1    Kang, R.2    Su, J.3
  • 9
    • 77956318815 scopus 로고    scopus 로고
    • Development research of science and technologies in ultra-precision machining field
    • YUAN Julong, ZHANG Feihu, DAI Yifan, et al. Development research of science and technologies in ultra-precision machining field [J]. Journal of Mechanical Engineering, 2010, 46(15): 161-177.
    • (2010) Journal of Mechanical Engineering , vol.46 , Issue.15 , pp. 161-177
    • Yuan, J.1    Zhang, F.2    Dai, Y.3
  • 12
    • 37449031560 scopus 로고    scopus 로고
    • Study on the surface layer damage of monocrystalline silicon wafer induced by ultra-precision grinding
    • Dalian: Dalian University of Technology
    • ZHANG Yinxia. Study on the surface layer damage of monocrystalline silicon wafer induced by ultra-precision grinding [D]. Dalian: Dalian University of Technology, 2006.
    • (2006)
    • Zhang, Y.1
  • 13
    • 78650943059 scopus 로고    scopus 로고
    • Study on the SSD distribution of large size Si wafer rotational ground surface
    • GAO Wei, ZHANG Yinxia, KANG Renke. Study on the SSD distribution of large size Si wafer rotational ground surface [J]. Semiconductor Technology, 2008, 33(10): 876-926.
    • (2008) Semiconductor Technology , vol.33 , Issue.10 , pp. 876-926
    • Gao, W.1    Zhang, Y.2    Kang, R.3
  • 14
    • 0030127076 scopus 로고    scopus 로고
    • Ductile-regime turning mechanism of single-crystal silicon
    • SHIBATA T, FUJII S, MAKINO E, et al. Ductile-regime turning mechanism of single-crystal silicon [J]. Precision Engineering, 1996, 18(2): 129-137.
    • (1996) Precision Engineering , vol.18 , Issue.2 , pp. 129-137
    • Shibata, T.1    Fujii, S.2    Makino, E.3
  • 15
    • 79957663469 scopus 로고    scopus 로고
    • Experimental investigation on the detection technique for surface layer damage of machined silicon wafers
    • ZHANG Yinxia, LI Dalei, GAO Wei, et al. Experimental investigation on the detection technique for surface layer damage of machined silicon wafers [J]. Journal of Synthetic Crystals, 2011, 40(2): 359-364.
    • (2011) Journal of Synthetic Crystals , vol.40 , Issue.2 , pp. 359-364
    • Zhang, Y.1    Li, D.2    Gao, W.3
  • 16
    • 33745158983 scopus 로고    scopus 로고
    • An improved angle polishing method for measuring subsurface damage in silicon wafers
    • HUO Fengwei, KANG Renke, GUO Dongming, et al. An improved angle polishing method for measuring subsurface damage in silicon wafers [J]. Chinese Journal of Semiconductors, 2006, 27(3): 506-510.
    • (2006) Chinese Journal of Semiconductors , vol.27 , Issue.3 , pp. 506-510
    • Huo, F.1    Kang, R.2    Guo, D.3
  • 18
    • 35948959051 scopus 로고    scopus 로고
    • Nanoscale cutting of monocrystalline silicon using molecular dynamics simulation
    • LI Xiaoping, CAI Minbo, RAHMAN M. Nanoscale cutting of monocrystalline silicon using molecular dynamics simulation [J]. Chinese Journal of Mechanical Engineering, 2007, 20(5): 8-11.
    • (2007) Chinese Journal of Mechanical Engineering , vol.20 , Issue.5 , pp. 8-11
    • Li, X.1    Cai, M.2    Rahman, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.