Easy orientation of diblock copolymers on self-assembled monolayers using UV irradiation

Macromolecules

Volumn 42, Issue 24, 2009, Pages 9609-9612

  Liu, Pang Hung ^a   Thébault, Pascal ^a   Guenoun, Patrick ^a   Daillant, Jean ^a  

^a CNRS UMR 3299   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BOX MODELS; DIBLOCK COPOLYMER; ELECTRON DENSITIES; ERROR FUNCTION; HEAD GROUPS; POWDER DIFFRACTOMETERS; REFLECTIVITY CURVE; RMS ROUGHNESS; ROCKING CURVES; ROUGH INTERFACES; SIEMENS; UV IRRADIATION; X RAY REFLECTIVITY;

BLOCK COPOLYMERS; COMPUTER SOFTWARE; COPOLYMERIZATION; DIFFRACTOMETERS; ELECTRON ENERGY LEVELS; REFLECTION; X RAY DIFFRACTION;

SELF ASSEMBLED MONOLAYERS;

EID: 74049133981     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma9021357     Document Type: Article

References (25)

1. Kellogg, G. J.; Walton, D. G.; Mayes, A. M.; Lambooy, P.; Russell, T. P.; Gallagher, P. D.; Satija, S. Phys. Rev. Lett. 1996, 76, 2503-2506.
2. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. J. Science 1997, 275, 1458-1460.
3. Huang, E.;Russell, T. P.;Harrison, C; Chaikin,P.M.;Register, R. A.; Hawker, C. J.; Mays, J. W. Macromolecules 1998, 31, 76417650.
4. Ryu, D. Y.; Wang, J.-Y.; Lavery, K. A.; Drockenmuller, E.; Satija, S. K.; Hawker, C. J.; Russell, T. P. Macromolecules 2007,40,42964300.
5. Ham, S.; Shin, C; Kim, E.; Ryu, D. Y.; Jeong, U.; Russell, T. P.; Hawker, C. J. Macromolecules 2008, 40, 6431-6437.
6. Han, E.; Stuen, K. O.; La, Y.-H.; Nealey, P. F.; Gopalan, P. Macromolecules 2008, 41, 9090-9097.
7. Park, D.-H. Nanoteehnology 2007, 18, 355304.
8. Niemz, A.; Bandyopadhyay, K.; Tan, E.; Cha, K.; Baker, S. M. Langmuir 2006, 22, 11092-11096.
9. Kim, T. K.; Yang, X. M.; Peters, R. D.; Sohn, B. H.; Nealey, P. F. J. Phys. Chem. B 2000, 104, 7403-7410.
10. Peters, R. D.; Yang, X. M.; Kim, T. K.; Sohn, B. H.; Nealey, P. F Langmuir 2000, 16,4625-4631.
11. Delorme, N.; Bardeau, J.-F.; Bulou, A.; Poncin-Epaillard, F. Thin Solid Films 2006, 496, 612-618.
12. Smith, A. P.; Sehgal, A.; Douglas, J. F.; Karim, A.; Amis, E. J. Macromol. Rapid Commun. 2003, 24, 131-135.
13. Ulman, A. Chem. Rev. 1996, 96, 1533-1554.
14. Tidswell, I. M.; Ocko, B. M.; Pershan, P. S.; Wasserman, S. R.; Whitesides, G. M.; Axe, J. D. Phys. Rev. B 1990, 41, 1111-1128.
15. Jiang, P.; Li, H. S.-Y.; Sugimura; Takai, O. Appl. Surf Sci. 2006, 252,4230-4235.
16. Bain, C; Troughton, E.; Tao, Y.-T.; Evall, J.; Whitesides, G.; Nuzzo, R. J. Am. Chem. Soc. 1989, 111, 321-335.
17. Caro, A.; Humblot, V.; Methivier, C; Minier, M.; Salmain, M.; Pradier, C-M. J. Phys. Chem. B 2009, 135, 2101-2109.
18. de Gennes, P. G. Rev. Mod. Phys. 1985, 57, 827-863.
19. Zisman, W. Contact Angle, Wettability and Adhesion. In Advances in Chemistry Series; Fowkes, F. M., Ed.; American Chemical Society: Washington, DC, 1964; Vol. 43, p 1.
20. van Giessen, A.; Bukman, D.; Widom, B. J. Colloid Interface Sci. 1997, 192, 257-265.
21. Brzoska, J. B.; Ben Azouz, I.; Rondelez, F. Langmuir 1994, 10, 4367-4373.
22. Stoykovich, M.; Muller, M.; Kim, S.; Solak, H.; Edwards, E.; de Pablo, J.; Nealey, P. Science (Washington, D.C) 2005, 308, 14421446.
23. Magonov, S.; Reneker, D. Annu. Rev. Mater. Sci 1997, 27, 175222.
24. Wu, S. J. Phys. Chem. 1970, 74, 632-638.
25. Chee, K. J. Appl. Polym. Sci 1998, 70, 697-703.