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Volumn 8, Issue 1, 2013, Pages 1041-1046

An in-situ study of copper electropolishing in phosphoric acid solution

Author keywords

Copper; ECMP; Electrochemical analysis; Electrolytic polishing; Planarization; Surface chemistry

Indexed keywords


EID: 84873857768     PISSN: None     EISSN: 14523981     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (17)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.