Electrochemical analysis of surface films on copper in phosphoric acid, with a focus on planarization

Journal of the Electrochemical Society

Volumn 156, Issue 5, 2009, Pages

  Kim, Bum Soo ^a   Beaudoin, Stephen P ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; COPPER; ELECTROLYTIC POLISHING; MICROELECTRONICS; PHOSPHORIC ACID; WIRE;

COPPER EXPOSURES; COPPER SURFACES; COPPER WIRES; ELECTRO-POLISHING; ELECTROCHEMICAL ANALYSIS; ELECTROCHEMICAL MECHANICAL PLANARIZATION; GUILLOTINED ELECTRODES; HIGH FREQUENCIES; IMPEDANCE RESPONSE; IN-SITU; MICROELECTRONICS INDUSTRIES; PASSIVE BEHAVIORS; PLANARIZATION; POTENTIODYNAMIC SCANS; RESISTIVE FILMS; SURFACE FILMS; SYSTEM IMPEDANCES; TIME EVOLUTIONS; VISCOUS LIQUIDS;

SURFACE ANALYSIS;

EID: 63649134372     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3095461     Document Type: Article

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