Characterization of phosphate electrolytes for use in Cu electrochemical mechanical planarization

Electrochimica Acta

Volumn 53, Issue 28, 2008, Pages 8211-8216

  Shattuck, Kristin G ^a   Lin, Jeng Yu ^a,b   Cojocaru, Paula ^c   West, Alan C ^a  

^a Department of Earth and Environmental Sciences   (United States)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c POLITECNICO DI MILANO   (Italy)

Author keywords

BTA; Copper; ECMP; Planarization; Potassium phosphate

Indexed keywords

CONCENTRATION (PROCESS); COPPER; DISKS (MACHINE COMPONENTS); DISSOLUTION; ELECTROLYTES; ROTATING DISKS;

APPLIED POTENTIALS; BENZOTRIAZOLE; BTA; CHEMICAL-MECHANICAL-PLANARIZATION; DISSOLUTION RATES; ECMP; ELECTROCHEMICAL MECHANICAL PLANARIZATION; ELECTROLYTE COMPOSITIONS; P H VALUES; PHOSPHATE ELECTROLYTES; PLANARIZATION; POTASSIUM PHOSPHATE; REMOVAL RATES; ROTATING DISK ELECTRODE; SALT CONCENTRATIONS; SLURRY PARTICLES;

ELECTROLYSIS;

EID: 50649119266     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.05.077     Document Type: Article

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