Synthesis and properties of Cr-Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse sputtering

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 22, Issue SUPPL.3, 2012, Pages

  Kang, Min Su ^a   Wang, Tie Gang ^a,b   Shin, Jung Ho ^a,c   Nowak, Roman ^d   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

^b INSTITUTE OF METAL RESEARCH   (China)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^d AALTO UNIVERSITY   (Finland)

Author keywords

Cr Al Si N film; DC pulsed sputtering; high power impulse magnetron sputtering; high temperature oxidation resistance

Indexed keywords

AMORPHOUS SI; FACE-CENTERED CUBIC; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HYBRID COATING SYSTEMS; MOLE FRACTION; NANO-COMPOSITE STRUCTURE; OXIDATION BEHAVIORS; PEAK VALUES; PHASE CONSTITUENT; PULSE CURRENTS; PULSED SPUTTERING; SI CONTENT; SI WAFER; SPUTTERING CURRENTS;

AMORPHOUS SILICON; COATINGS; DEPOSITS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; METALLIC FILMS; OXIDATION RESISTANCE; SILICON; SILICON WAFERS; THERMOOXIDATION;

ALUMINUM;

EID: 84873586507     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(12)61795-6     Document Type: Article

References (35)

1. JW HE, DD BAI, KW XU, NS HU Improving the anticorrosion and mechanical behaviour of PACVD TiN [J] Surface and Coating Technology 74-75 1995 387 393
2. JE SUNDGREN, BO JOHANSSON, SE KARLASSON, HTG HENTZELL Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure [J] Thin Solid Films 105 4 1983 367 384
3. ySix)N superhard nanocomposite coatings reaching the hardness of diamond [J] Surface and Coating Technology 120-121 1999 173 178
4. J ECHIGOYA, ZT LIU, A IMAMURA, A TAKATSU Transmission electron microscopy studies of growth and interface structure of chemically vapour deposited TiC and TiN films on WC/Co alloy substrates [J] Thin Solid Films 198 1991 293 300
5. M WITTMER, J NOSER, H MELCHIOR Oxidation kinetics of TiN thin films [J] Journal of Applied Physics 52 11 1981 6659 6664
6. C REBHOLZ, H ZIEGELE, A LEYLAND, A MATTEW Structure, mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering [J] Surface and Coating Technology 115 1999 222 229
7. J CREUS, H INDRISS, H MAZILLE, F SANCHETTE, P JACQUOT Improvement of the corrosion resistance of CrN coated steel by an interlayer [J] Surface and Coating Technology 107 1998 183 190
8. B NAVINSEK, P PANJAN, I MILOSEV Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures [J] Surface and Coating Technology 97 1997 182 191
9. B NAVINSEK, P PANJAN Novel applications of CrN (PVD) coatings deposited at 200 °C [J] Surface and Coating Technology 74-75 1995 919 926
10. XT ZENG Unbalanced magnetron sputtered carbon composite coatings [J] Journal of Vacuum Science & Technology A 17 4 1991 1991 1995
11. JJ NAINAPARAMPIL, JS ZABINSKI, A KORENYI-BOTH Formation and characterization of multiphase film properties of (Ti-Cr)N formed by cathodic arc deposition [J] Thin Solid Films 333 1998 88 94
12. S ULRICH, S SATTEL Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films [J] Thin Solid Films 437 2003 164 169
13. JC SÁNCHEZ-LÓPEZ, D MARTÍNEZ-MARTÍNEZ, C LÓPEZ-CARTES, A FERNÁNDEZ, M BRIZUELA, A GARCÍA-LUIS, OÑATE Mechanical behavior and oxidation resistance of Cr(Al)N coatings [J] Journal of Vacuum Science & Technology A 23 4 2005 681 686
14. JH PARK, WS CHUNG, YR CHO, KH KIM Synthesis and mechanical properties of Cr-Si-N coatings deposited by a hybrid system of arc ion plating and sputtering techniques [J] Surface and Coating Technology 188-189 2004 425 430
15. E MARTINEZ, R SANJINES, A KARIMI, J ESTEVE, F LÉVY Mechanical properties of nanocomposite and multilayered Cr-Si-N sputtered thin films [J] Surface and Coating Technology 180-181 2004 570 574
16. B ROTHER, H KAPPL Effects of low boron concentrations on the thermal stability of hard coatings [J] Surface and Coating Technology 96 2-3 1997 163 168
17. J ALMER, M ODEN, G HAKANSSON Microstructure, stress and mechanical properties of arc-evaporated Cr-C-N coatings [J] Thin Solid Films 385 2001 190 197
18. SH YAO, YL SU The tribological potential of CrN and Cr(C,N) deposited by multi-arc PVD process [J] Wear 212 1 1997 85 94
19. M CEKADA, P PANJAN, B NAVINSEK, F CVELBAR Characterization of (Cr,Ta)N hard coatings reactively sputtered at low temperature [J] Vacuum 52 4 1999 461 467
20. R SAHA, RB INTURI, JA BARNARD Structural and mechanical characterization of Cr-Ta-N hard coatings prepared by reactive magnetron sputtering [J] Surface and Coating Technology 82 1-2 1996 42 47
21. JN TAN, JH HSIEH Deposition and characterization of (Nb,Cr)N thin films by unbalanced magnetron sputtering [J] Surface and Coating Technology 167 2-3 2003 154 160
22. F REGENT, J MUSIL Magnetron sputtered Cr-Ni-N and Ti-Mo-N films: comparison of mechanical properties [J] Surface and Coating Technology 142-144 2001 146 151
23. XN films [J] Surface and Coating Technology 165 2 2003 163 167
24. xN thin films deposited by reactive magnetron sputtering [J] Surface and Coating Technology 163-164 2003 57 61
25. D MERCS, N BONASSO, S NAAMANE, JM BORDES, C CODDET Mechanical and tribological properties of Cr-N and Cr-SI-N coatings reactively sputter deposited [J] Surface and Coating Technology 200 2005 403 407
26. O KNOTEK, F LOEFFLER, H SCHOLL Properties of arc-evaporated CrN and (Cr,Al)N coatings [J] Surface and Coating Technology 45 1-3 1991 53 58
27. E LUGSCHEIDER, K BOBZIN, TH HORNIG, M MASES Investigation of the residual stresses and mechanical properties of (Cr,Al)N arc PVD coatings used for semi-solid metal (SSM) forming dies [J] Thin Solid Films 420-421 2002 318 323
28. HC BARSHILIA, B DEEPTHI, N SELVAKUMAR, A JAIN, KS RAJAM Nanolayered multilayer coatings of CrN/CrAlN prepared by reactive DC magnetron sputtering [J] Applied Surface Science 253 11 2007 5076 5083
29. A ANDERS Physics of arcing, and implications to sputter deposition [J] Thin Solid Films 502 1-2 2006 22 28
30. V KOUZNETSOV, K MACAK, JM SCHNEIDER, U HELMERSSON, I PETROV A novel pulsed magnetron sputter technique utilizing very high target power densities [J] Surface and Coating Technology 122 2-3 1999 290 293
31. U HELMERSSON, M LATTEMANN, J BOHLMARK, AP EHIASARIAN, JT GUDMUNDSSON Ionized physical vapor deposition (IPVD): A review of technology and applications [J] Thin Solid Films 513 1-2 2006 1 24
32. 4 system [J] Applied Physics Letter 66 20 1995 2640 2642
33. A LASALMONIE, JL STRUDEL Influence of grain size on the mechanical behaviour of some high strength materials [J] Journal of Materials Science 21 1986 1837 1852
34. M DISERENS, J PATSCHEIDER, F LÉVY Improving the properties of titanium nitride by incorporation of silicon [J] Surface and Coating Technology 108-109 1998 241 246
35. SK KIM, PV VINH, JW LEE Deposition of superhard nanolayered TiCrAlSiN thin films by cathodic arc plasma deposition [J] Surface and Coating Technology 202 2008 5395 5399