Deposition and characterization of (Nb,Cr)N thin films by unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 167, Issue 2-3, 2003, Pages 154-160

  Tan, J N ^a   Hsieh, J H ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Glow discharge optical spectrometer; Tribological properties; Unbalanced magnetron sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; ELECTRIC FIELD EFFECTS; FRICTION; HARDNESS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

GLOW DISCHARGE OPTICAL SPECTROMETER (GDOS);

COATINGS;

CHROMIUM; COATING; NIOBIUM; NITRIDE; SPUTTERING;

EID: 0037461178     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00907-6     Document Type: Article

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