Deposition of superhard nanolayered TiCrAlSiN thin films by cathodic arc plasma deposition

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5395-5399

  Kim, Sun Kyu ^a   Vinh, Pham Van ^b   Lee, Jae Wook ^c  

^a University of Ulsan   (South Korea)

^b HANOI UNIVERSITY OF EDUCATION   (Viet Nam)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Cathodic arc plasma deposition; Superhard nanolayered films; TiCrAlSiN films

Indexed keywords

BIAS VOLTAGE; CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; ELECTRON TUBES; HARDNESS; MECHANICAL PROPERTIES; NITROGEN; NONMETALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THICK FILMS; THIN FILMS; TOOL STEEL;

ARC CURRENTS; CATHODIC ARC PLASMA DEPOSITION; FILM HARDNESS; INCREASE IN PRESSURE; MAXIMUM HARDNESS; NITROGEN PRESSURES; STEEL SUBSTRATES; STRUCTURAL PROPERTIES; SUPERHARD; SUPERHARD NANOLAYERED FILMS; TICRALSIN FILMS;

PLASMA DEPOSITION;

EID: 50349095559     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.020     Document Type: Article

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