Mechanism of nanowire formation in metal assisted chemical etching

Electrochimica Acta

Volumn 92, Issue , 2013, Pages 139-147

  Smith, Zachary R ^a   Smith, Rosemary L ^c,d   Collins, Scott D ^b,d  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b University of Maine ^*  (United States)

^c The University of Maine   (United States)

^d UNIVERSITY OF MAINE   (United States)

Author keywords

Electrochemistry; Metal assisted etching; Silicon nanowires

Indexed keywords

DIFFUSION LIMITED; EXCHANGE CURRENT DENSITIES; ION REACTIONS; METAL ASSISTED ETCHINGS; METAL-ASSISTED CHEMICAL ETCHING; NANOWIRE FORMATION; SILICON NANOWIRES; SILVER METAL; TRANSITION METAL SYSTEM; UNIVERSAL MODEL;

AGGLOMERATION; ELECTROCHEMISTRY; ETCHING; ION EXCHANGE; REACTION KINETICS; SILICON; TRANSITION METALS;

NANOWIRES;

EID: 84873052023     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.12.075     Document Type: Article

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