Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts

Solar Energy Materials and Solar Cells

Volumn 103, Issue , 2012, Pages 98-107

  Geng, Xuewen ^a,b   Qi, Zhe ^c   Li, Meicheng ^d   Duan, Barrett K ^e   Zhao, Liancheng ^a   Bohn, Paul W ^b,e  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b University of Notre Dame   (United States)

^c INSTITUTE OF CHEMISTRY   (China)

^d NORTH CHINA ELECTRIC POWER UNIVERSITY   (China)

^e UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

Antireflection; Metal assisted chemical etching; Porous silicon

Indexed keywords

AG FILMS; AG PARTICLES; ANTI-REFLECTION; ANTI-REFLECTIVE LAYERS; CHEMICAL ETCHING; IN-SITU DEPOSITION; METAL-ASSISTED CHEMICAL ETCHING; MICRO-SCALES; NANO SCALE; NANO-SCALE ROUGHNESS; OPTIMAL CONDITIONS; PROCESSING CONDITION; REDUCTANTS; SILVER NANOPARTICLES; SURFACE REFLECTIVITY;

ALDEHYDES; ETCHING; GLUCOSE; METAL NANOPARTICLES; NANOTECHNOLOGY; POROUS SILICON; REFLECTION; SILICON; SILICON WAFERS; TEXTURES;

SILVER;

EID: 84860586260     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2012.04.020     Document Type: Article

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