Silver-assisted electroless etching mechanism of silicon

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 2, 2008, Pages 225-230

  Douani, R ^a   Si Larbi, K ^b   Hadjersi, T ^b   Megouda, N ^a   Manseri, A ^b  

^a UNIVERSITÉ MOULOUD MAMMERI   (Algeria)

^b L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION MECHANISMS; ELECTROLESS; ETCHING MECHANISMS; ETCHING SYSTEMS; ETCHING TIMES; OXIDIZING AGENTS; RAY ANALYSES; SECONDARY IONS;

CHROMIUM; DISSOLUTION; MASS SPECTROMETRY; METAL RECOVERY; MICROSCOPIC EXAMINATION; OXIDATION; SILICON;

ETCHING;

EID: 50949102645     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200723159     Document Type: Article

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