Exceeding the diffraction limit with single-photon photopolymerization and photo-induced termination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7053, Issue , 2008, Pages

  Kowalski, Benjamin A ^a   Scott, Timothy F ^a   Bowman, Christopher N ^a   Sullivan, Amy C ^b   McLeod, Robert R ^a  

^a UCB 450   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

Lithography; Photochromic polymers; Two photon polymerization

Indexed keywords

ABS RESINS; ABSORPTION; CHEMICAL REACTIONS; CORUNDUM; DIFFRACTION; ELECTROMAGNETIC WAVE DIFFRACTION; LASER EXCITATION; LIGHT; LITHOGRAPHY; MONOMERS; MULTIPHOTON PROCESSES; OPTICAL PROPERTIES; PARTICLE BEAMS; PHOTOCHROMISM; PHOTOPOLYMERIZATION; PHOTOPOLYMERS; POLYMERIZATION; POLYMERS; PULSED LASER APPLICATIONS; RESINS;

3D MICROSTRUCTURES; COMPLEX STRUCTURES; DIFFRACTION LIMITS; FEATURE SIZES; FOCAL POINTS; LIGHT INTENSITIES; MEMORY EFFECTS; PHOTOCHROMIC POLYMERS; PHOTOINITIATED; PHOTON ABSORBERS; PHOTON ABSORPTIONS; SINGLE PHOTONS; TI:SAPPHIRE LASERS; TWO PHOTON POLYMERIZATION; TWO WAVELENGTHS; TWO-PHOTON ABSORPTIONS; TWO-PHOTON POLYMERIZATIONS; WAVELENGTH OF LIGHTS;

PHOTONS;

EID: 55549112575     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.796978     Document Type: Conference Paper

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