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Volumn 5, Issue 3, 2013, Pages 961-970
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A DLVO model for catalyst motion in metal-assisted chemical etching based upon controlled out-of-plane rotational etching and force-displacement measurements
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ACIDIC CONDITIONS;
DLVO THEORY;
DRIVING FORCES;
FACILE FABRICATION;
FORCE-DISPLACEMENT;
FORCE-DISPLACEMENT CURVES;
METAL-ASSISTED CHEMICAL ETCHING;
METALLIC STRUCTURES;
MINIMUM PRESSURE;
OUT-OF-PLANE;
PLASTIC DEFORMATION MODEL;
PRESSURE DIFFERENTIAL;
ROTATION ANGLES;
ROTATIONAL STRUCTURES;
SILICON SUBSTRATES;
VERTICALLY ALIGNED;
ETCHING;
NANOSTRUCTURES;
SILICON;
SILICON OXIDES;
THREE DIMENSIONAL COMPUTER GRAPHICS;
CATALYSTS;
METAL NANOPARTICLE;
ARTICLE;
CATALYSIS;
CHEMICAL MODEL;
CHEMICAL STRUCTURE;
CHEMISTRY;
MECHANICAL STRESS;
MOTION;
ROTATION;
SURFACE PROPERTY;
ULTRASTRUCTURE;
YOUNG MODULUS;
CATALYSIS;
ELASTIC MODULUS;
METAL NANOPARTICLES;
MODELS, CHEMICAL;
MODELS, MOLECULAR;
MOTION;
ROTATION;
STRESS, MECHANICAL;
SURFACE PROPERTIES;
MLCS;
MLOWN;
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EID: 84872725917
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c2nr32293e Document Type: Article |
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Times cited : (38)
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References (32)
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