Advances and new directions in gas-sensing devices

Acta Materialia

Volumn 61, Issue 3, 2013, Pages 974-1000

  Kim, Il Doo ^a   Rothschild, Avner ^b   Tuller, Harry L ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Gas sensors; Nanostructured architectures; Operating principles; Response mechanisms; Semiconducting oxides

Indexed keywords

ANALYTES; ANALYTICAL METHOD; BREATH ANALYSIS; COMBUSTIBLE GAS; COMBUSTION PRO-CESS; FIELD EFFECTS; GAS SENSING; GASPHASE; HARSH ENVIRONMENT; HIGH RESOLUTION; MATERIALS PROCESSING; NANO-STRUCTURED; NANOBALANCE; OPERATING PRINCIPLES; ORDERS OF MAGNITUDE; RESPONSE MECHANISMS; SELECTED EXAMPLES; SEMICONDUCTING OXIDE; SENSOR SENSITIVITY; SPEED OF RESPONSE; TECHNOLOGICAL DEVELOPMENT;

AUTOMOBILE MANUFACTURE; CHEMICAL CONTAMINATION; CHEMICAL SENSORS; DIAGNOSIS; ELECTRIC PROPERTIES; GAS DETECTORS; METALLIC COMPOUNDS; SENSORS;

CHEMICAL DETECTION;

EID: 84872695838     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2012.10.041     Document Type: Article

References (184)

1. J. Riegel, H. Neumann, and H.M. Wiedenmann Solid State Ionics 152 2002 783
2. M. Holzinger, J. Maier, and W. Sitte Solid State Ionics 94 1997 217
3. N. Imanaka, and S. Tamura J Electroceram 24 2010 331
4. S. Nazarpour, C. Lopez-Gandara, C. Zamani, F.M. Ramos, and A. Cirera Sensor Actuat B-Chem 155 2011 489
5. U.G. Alkemade, and B. Schumann Solid State Ionics 177 2006 2291
6. E. Ivers-Tiffeé, K.H. Härdtl, W. Menesklou, and J. Riegel Oxygen sensors for lean combustion engines J.G. Heinrich, F. Aldinger, Ceramic materials and components for engines 2001 Wiley-VCH Weinheim
7. A. Rothschild, S.J. Litzelman, H.L. Tuller, W. Menesklou, T. Schneider, and E. Ivers-Tiffee Sensor Actuat B-Chem 108 2005 223
8. D.K. Aswal, and S.K. Gupta Science and technology of chemiresistor gas sensors 2007 Nova Science Publishers New York
9. Tuller HL. Materials for high temperature electrochemical applications: automotive sensors, catalysts and traps. Sensor Actuat B. http://dx.doi.org/10. 1016/j.snb.2012.09.069.
10. V.M. Mecea Sensor Actuat A-Phys 128 2006 270
11. H.L. Tuller, and R. Mlcak Curr Opin Solid State Mater Sci 3 1998 501
12. H.L. Tuller, and R. Mlcak J Electroceram 4 2000 415
13. W. Jung, K. Sahner, A. Leung, and H.L. Tuller Sensor Actuat B-Chem 141 2009 485
14. C.M.L. Scholz, V.R. Gangwal, J.H.B.J. Hoebink, and J.C. Schouten Appl Catal B-Environ 70 2007 226
15. H. Fritze, H.L. Tuller, H. Seh, and G. Borchardt Sensor Actuat B-Chem 76 2001 103
16. H. Fritze Meas Sci Technol 2011 22
17. P. Hofmann, K. Jacobs, H. Federmann, M. Schulz, H. Fritze, and H.L. Tuller Solid State Ionics 177 2006 3175
18. H. Seh, H. Fritze, and H.L. Tuller J Electroceram 18 2007 139
19. H.L. Tuller MEMS-based thin film and resonant chemical sensors N. Setter, Electroceramic-based MEMS: fabrication-technology and applications 2005 Springer New York
20. Doppalapudi D, Mlcak R, LeClair J, Gwynne P, Bridgham J, Purchase S, et al. MEMS microresonators for high temperature sensor applications. In: Microelectromechanical systems - materials and devices III. Mater Res Soc symp proc, vol. 1222. Warrendale, PA; 2010. 1222-DD01-02.
21. D.E. Williams Conduction and gas response of semiconductor gas sensors P.T. Moseley, B.C. Tofield, Solid state gas sensors 1987 Adam Hilger Bristol
22. M.J. Madou, and S.R. Morrison Chemical sensing with solid state devices 1989 Academic Press Boston (MA)
23. P.T. Moseley, and D.E. Williams Oxygen surface species on semiconducting oxides Techniques and mechanisms in gas sensing 1991 Adam Hilger Bristol
24. P.T. Moseley, J.O.W. Norris, and D.E. Williams Techniques and mechanisms in gas sensing 1991 Adam Hilger Bristol and Philadelphia
25. F.A. Kröger, and H.J. Vink Relations between the concentrations of imperfections in crystalline solids F. Seitz, D. Turnbull, Solid state physics vol. 3 1956 Academic Press New York
26. T. Bak, and J. Nowotny J Phys Chem C 115 2011 15345
27. J. Fleig, R. Merkle, and J. Maier Phys Chem Chem Phys 9 2007 2713
28. R. Merkle, and J. Maier Angew Chem Int Edit 47 2008 3874
29. W. Jung, and H.L. Tuller Adv Energy Mater 1 2011 1184
30. S.B. Adler, X.Y. Chen, and J.R. Wilson J Catal 245 2007 91
31. A. Rothschild, Y. Komem, and F. Cosandey J Electrochem Soc 148 2001 H85
32. J. Jamnik, B. Kamp, R. Merkle, and J. Maier Solid State Ionics 150 2002 157
33. C. Korber, A. Wachau, P. Agoston, K. Albe, and A. Klein Phys Chem Chem Phys 13 2011 3223
34. W. Gopel Prog Surf Sci 20 1985 9
35. A. Rothschild, W. Menesklou, H.L. Tuller, and E. Ivers-Tiffee Chem Mater 18 2006 3651
36. Logothetis EM. Resistive-type exhaust gas sensors. In: Smothers WJ, editor. Proceedings of the 8th automotive materials conference. Ceramic engineering and science proceedings, vol. 1, no. 5/6. Hoboken (NJ): John Wiley & Sons. http://dx.doi.org/10.1002/9780470291023 [chapter 7].
37. M. Batzill, K. Katsiev, J.M. Burst, U. Diebold, A.M. Chaka, and B. Delley Phys Rev B 72 2005
38. W. Wolkenstein Electronic processes on semiconductor surfaces during chemisorption 1991 Consultants Bureau New York
39. H. Geistlinger Sensor Actuat B-Chem 17 1993 47
40. A. Rothschild, and Y. Komem Sensor Actuat B-Chem 93 2003 362
41. A. Rothschild, Y. Komem, and N. Ashkenasy J Appl Phys 92 2002 7090
42. P.B. Weisz J Chem Phys 21 1953 1531
43. V.E. Henrich, and P.A. Cox The surface science of metal oxides 1994 Cambridge University Press Cambridge and New York
44. M. Batzill, and U. Diebold Prog Surf Sci 79 2005 47
45. U. Diebold Surf Sci Rep 48 2003 53
46. D.E. Williams, and P.T. Moseley J Mater Chem 1 1991 809
47. N. Barsan, and U. Weimar J Phys-Condens Mater 15 2003 R813
48. N. Barsan, M. Schweizer-Berberich, and W. Gopel Fresen J Anal Chem 365 1999 287
49. P.K. Clifford, and D.T. Tuma Sensor Actuat 3 1983 233
50. S. Strässler, and A. Reis Sensor Actuat 4 1983 465
51. S.R. Morrison Sensor Actuat 11 1987 283
52. J.F. McAleer, P.T. Moseley, J.O.W. Norris, and D.E. Williams J Chem Soc Faraday Trans 83 1983 1323
53. N. Barsan, and U. Weimar J Electroceram 7 2001 143
54. D.E. Williams, and K.F.E. Pratt Sensor Actuat B-Chem 70 2000 214
55. G. Chabanis, I.P. Parkin, and D.E. Williams Meas Sci Technol 14 2003 76
56. M.E. Franke, T.J. Koplin, and U. Simon Small 2 2006 36
57. N. Yamazoe Sensor Actuat B-Chem 5 1991 7
58. H.T. Macholdt, and R. Vaneldik Transit Metal Chem 10 1985 323
59. G. Magner, M. Savy, G. Scarbeck, J. Riga, and J.J. Verbist J Electrochem Soc 128 1981 1674
60. N. Barsan, D. Koziej, and U. Weimar Sensor Actuat B-Chem 121 2007 18
61. H. Windischmann, and P. Mark J Electrochem Soc 126 1979 627
62. S.R. Morrison Sensor Actuat 2 1982 329
63. G. Heiland Sensor Actuat 2 1982 343
64. J.W. Orton, and M.J. Powell Rep Prog Phys 43 1980 1263
65. C.N. Xu, J. Tamaki, N. Miura, and N. Yamazoe Sensor Actuat B-Chem 3 1991 147
66. A. Rothschild, and Y. Komem J Appl Phys 95 2004 6374
67. A. Rothschild, and Y. Komem J Electroceram 13 2004 697
68. V.Y. Sukharev J Chem Soc Faraday Trans 89 1993 559
69. S. Kirkpatr Rev Mod Phys 45 1973 574
70. A.D. Brailsford, and E.M. Logothetis Sensor Actuat 7 1985 39
71. J.W. Gardner Semicond Sci Technol 4 1989 345
72. J.W. Gardner Sensor Actuat B-Chem 1 1990 166
73. P.N. Bartlett, and J.W. Gardner Philos Trans Roy Soc A 354 1996 35
74. D.E. Williams, G.S. Henshaw, K.F.E. Pratt, and R. Peat J Chem Soc Faraday Trans 91 1995 4299
75. G. Sakai, N. Matsunaga, K. Shimanoe, and N. Yamazoe Sensor Actuat B-Chem 80 2001 125
76. P. Boeker, O. Wallenfang, and G. Horner Sensor Actuat B-Chem 83 2002 202
77. D.E. Williams, and K.F.E. Pratt J Chem Soc Faraday Trans 91 1995 1961
78. P. Althainz, J. Goschnick, S. Ehrmann, and H.J. Ache Sensor Actuat B-Chem 33 1996 72
79. A. Wei, L.H. Pan, and W. Huang Mater Sci Eng B-Adv 176 2011 1409
80. X.J. Huang, and Y.K. Choi Sensor Actuat B-Chem 122 2007 659
81. N.S. Ramgir, Y. Yang, and M. Zacharias Small 6 2010 1705
82. H.R. Kim, K.I. Choi, K.M. Kim, I.D. Kim, G. Cao, and J.H. Lee Chem Commun (Camb) 46 2010 5061
83. G.L. Han, Q.H. Lu, G.H. Liu, X.L. Ye, S.M. Lin, and Y.Z. Song J Mater Sci-Mater Electron 23 2012 1616
84. H.J. Kim, K.I. Choi, A.Q. Pan, I.D. Kim, H.R. Kim, and K.M. Kim J Mater Chem 21 2011 6549
85. H.G. Moon, Y.S. Shim, D. Su, H.H. Park, S.J. Yoon, and H.W. Jang J Phys Chem C 115 2011 9993
86. N.G. Cho, I.S. Hwang, H.G. Kim, J.H. Lee, and I.D. Kim Sensor Actuat B-Chem 155 2011 366
87. Y.E. Chang, D.Y. Youn, G. Ankonina, D.J. Yang, H.G. Kim, and A. Rothschild Chem Commun 4019 2009
88. N.G. Cho, G.C. Whitfield, D.J. Yang, H.G. Kim, H.L. Tuller, and I.D. Kim J Electrochem Soc 157 2010 J435
89. H.N. Hieu, N.M. Vuong, H. Jung, D.M. Jang, D. Kim, and H. Kim J Mater Chem 22 2012 1127
90. F. Song, H.L. Su, J.J. Chen, W.J. Moon, W.M. Lau, and D. Zhang J Mater Chem 22 2012 1121
91. Y.C. Her, C.K. Chiang, S.T. Jean, and S.L. Huang Crystengcomm 14 2012 1296
92. H.J. Zhang, R.F. Wu, Z.W. Chen, G. Liu, Z.N. Zhang, and Z. Jiao Crystengcomm 14 2012 1775
93. M. Tonezzer, and N.V. Hieu Sensor Actuat B-Chem 163 2012 146
94. G. Sberveglieri, I. Concina, E. Comini, M. Falasconi, M. Ferroni, and V. Sberveglieri Vacuum 86 2012 532
95. Z. Wang, Y.M. Hu, W. Wang, X. Zhang, B.X. Wang, and H.Y. Tian Int J Hydrogen Energy 37 2012 4526
96. E. Strelcov, Y. Lilach, and A. Kolmakov Nano Lett 9 2009 2322
97. J. Lee, D.H. Kim, S.H. Hong, and J.Y. Jho Sensor Actuat B-Chem 160 2011 1494
98. S. Cho, D.H. Kim, B.S. Lee, J. Jung, W.R. Yu, and S.H. Hong Sensor Actuat B-Chem 162 2012 300
99. S. Joo, I. Muto, and N. Hara J Electrochem Soc 157 2010 J221
100. B.C. Cheng, B.X. Tian, C.C. Xie, Y.H. Xiao, and S.J. Lei J Mater Chem 21 2011 1907
101. S.W. Choi, J.Y. Park, and S.S. Kim Chem Eng J 172 2011 550
102. S.K. Lim, S.H. Hwang, D. Chang, and S. Kim Sensor Actuat B-Chem 149 2010 28
103. H.T. Fan, X.J. Xu, X.K. Ma, and T. Zhang Nanotechnology 22 2011
104. J. Shin, S.J. Choi, D.Y. Youn, and I.D. Kim J Electroceram 29 2012 106
105. D.K. Hwang, S. Kim, J.H. Lee, I.S. Hwang, and I.D. Kim J Mater Chem 21 2011 1959
106. L.L. Wang, Z. Lou, T. Zhang, H.T. Fan, and X.J. Xu Sensor Actuat B-Chem 155 2011 285
107. Z. Chen, M.H. Cao, and C.W. Hu J Phys Chem C 115 2011 5522
108. H. Wang, Q.Q. Liang, W.J. Wang, Y.R. An, J.H. Li, and L. Guo Cryst Growth Des 11 2011 2942
109. K.M. Kim, H.R. Kim, K.I. Choi, H.J. Kim, and J.H. Lee Sensor Actuat B-Chem 155 2011 745
110. D.J. Yang, I. Kamienchick, D.Y. Youn, A. Rothschild, and I.D. Kim Adv Funct Mater 20 2010 4258
111. J. Moon, J.A. Park, S.J. Lee, T. Zyung, and I.D. Kim Sensor Actuat B-Chem 149 2010 301
112. H.R. Kim, A. Haensch, I.D. Kim, N. Barsan, U. Weimar, and J.H. Lee Adv Funct Mater 21 2011 4456
113. J.H. Lee Sensor Actuat B-Chem 140 2009 319
114. N. Singh, R.K. Gupta, and P.S. Lee ACS Appl Mater Inter 3 2011 2246
115. Z.L. Wang Mater Sci Eng R 64 2009 33
116. X.P. Li, Y. Wang, Y. Lei, and Z.Y. Gu RSC Adv 2 2012 2302
117. G.X. Wang, J.S. Park, M.S. Park, and X.L. Gou Sensor Actuat B-Chem 131 2008 313
118. L.Q. Mai, L. Xu, Q.A. Gao, C.H. Han, B. Hu, and Y.Q. Pi Nano Lett 10 2010 2604
119. X. Cao, N. Wang, L. Wang, C.P. Mo, Y.J. Xu, and X.L. Cai Sensor Actuat B-Chem 147 2010 730
120. I.D. Kim, and A. Rothschild Polym Adv Technol 22 2011 318
121. I.D. Kim, A. Rothschild, B.H. Lee, D.Y. Kim, S.M. Jo, and H.L. Tuller Nano Lett 6 2006 2009
122. P.C. Chen, G.Z. Shen, and C.W. Zhou IEEE Trans Nanotechnol 7 2008 668
123. J.M. Tarascon, D.C. Johnson, and M.J. Sienko Inorg Chem 22 1983 3769
124. Y.J. Choi, I.S. Hwang, J.G. Park, K.J. Choi, J.H. Park, and J.H. Lee Nanotechnology 19 2008
125. I.S. Hwang, J.K. Choi, H.S. Woo, S.J. Kim, S.Y. Jung, and T.Y. Seong ACS Appl Mater Inter 3 2011 3140
126. C.W. Na, H.S. Woo, I.D. Kim, and J.H. Lee Chem Commun 47 2011 5148
127. Y.H. Lin, Y.C. Hsueh, P.S. Lee, C.C. Wang, J.M. Wu, and T.P. Perng J Mater Chem 21 2011 10552
128. D.D. Li, J. Hu, R.Q. Wu, and J.G. Lu Nanotechnology 21 2010 485502
129. C.Y. Jin, Z.Y. Li, R.S. Williams, K.C. Lee, and I. Park Nano Lett 11 2011 4818
130. R.S. Yang, and Z.L. Wang Philos Mag 87 2007 2097
131. S.L. Luo, F. Su, C.B. Liu, J.X. Li, R.H. Liu, and Y. Xiao Talanta 86 2011 157
132. Q. Wang, Y.Z. Pan, S.S. Huang, S.T. Ren, P. Li, and J.J. Li Nanotechnology 22 2011
133. S.W. Lin, D.R. Li, J. Wu, X.G. Li, and S.A. Akbar Sensor Actuat B-Chem 156 2011 505
134. S.H. Choi, G. Ankonina, D.Y. Youn, S.G. Oh, J.M. Hong, and A. Rothschild ACS Nano 3 2009 2623
135. N.G. Cho, D.J. Yang, M.J. Jin, H.G. Kim, H.L. Tuller, and I.D. Kim Sensor Actuat B-Chem 160 2011 1468
136. N.G. Cho, H.S. Woo, J.H. Lee, and I.D. Kim Chem Commun 47 2011 11300
137. N.G. Cho, and I.D. Kim Sensor Actuat B-Chem 160 2011 499
138. Z.Y. Zhang, X.H. Li, C.H. Wang, L.M. Wei, Y.C. Liu, and C.L. Shao J Phys Chem C 113 2009 19397
139. J.Y. Park, S.W. Choi, and S.S. Kim Nanotechnology 21 2010
140. Q. Peng, X.Y. Sun, J.C. Spagnola, G.K. Hyde, R.J. Spontak, and G.N. Parsons Nano Lett 7 2007 719
141. R.R. Zhao, M.Z. Xu, J.A. Wang, and G.N. Chen Electrochim Acta 55 2010 5647
142. X. Chen, Z. Guo, W.H. Xu, H.B. Yao, M.Q. Li, and J.H. Liu Adv Funct Mater 21 2011 2049
143. O. Landau, and A. Rothschild Chem Mater 21 2009 9
144. O. Landau, and A. Rothschild Sensor Actuat B-Chem 171 2012 118
145. S.H. Choi, I.S. Hwang, J.H. Lee, S.G. Oh, and I.D. Kim Chem Commun 47 2011 9315
146. W. Li, L.S. Zhang, Q. Wang, Y. Yu, Z. Chen, and C.Y. Cao J Mater Chem 22 2012 15342
147. I.D. Kim, J.M. Hong, B.H. Lee, D.Y. Kim, E.K. Jeon, and D.K. Choi Appl Phys Lett 91 2007 163109
148. I.D. Kim, E.K. Jeon, S.H. Choi, D.K. Choi, and H.L. Tuller J Electroceram 25 2010 159
149. S.J. Kim, I.S. Hwang, C.W. Na, I.D. Kim, Y.C. Kang, and J.H. Lee J Mater Chem 21 2011 18560
150. Y. Qin, F. Zhang, Y. Chen, Y.J. Zhou, J. Li, and A.W. Zhu J Phys Chem C 116 2012 11994
151. L.L. Wang, Z. Lou, R. Wang, T. Fei, and T. Zhang J Mater Chem 22 2012 12453
152. A. Rothschild, and H.L. Tuller J Electroceram 17 2006 1005
153. K. Katagiri, H. Inami, K. Koumoto, K. Inumaru, K. Tomita, and M. Kobayashi Inorg Chem 2012 3267
154. C.J. Martinez, B. Hockey, C.B. Montgomery, and S. Semancik Langmuir 21 2005 7937
155. I.D. Kim, A. Rothschild, T. Hyodo, and H.L. Tuller Nano Lett 6 2006 193
156. I.D. Kim, A. Rothschild, D.J. Yang, and H.L. Tuller Sensor Actuat B-Chem 130 2008 9
157. S.C. Yang, D.J. Yang, J. Kim, J.M. Hong, H.G. Kim, and I.D. Kim Adv Mater 20 2008 1059
158. C.Y. Lee, S.J. Kim, I.S. Hwang, and J.H. Lee Sensor Actuat B-Chem 142 2009 236
159. Y.D. Zhang, G.C. Jiang, K.W. Wong, and Z. Zheng Sensor Lett 8 2010 355
160. V.P. Verma, S. Das, S. Hwang, H. Choi, M. Jeon, and W. Choi Mater Sci Eng B-Adv 171 2010 45
161. A.M. Andringa, J.R. Meijboom, E.C.P. Smits, S.G.J. Mathijssen, P.W.M. Blom, and D.M. de Leeuw Adv Funct Mater 21 2011 100
162. N. Singh, C.Y. Yan, and P.S. Lee Sensor Actuat B-Chem 150 2010 19
163. E.N. Dattoli, A.V. Davydov, and K.D. Benkstein Nanoscale 4 2012 1760
164. S.Y. Ju, A. Facchetti, Y. Xuan, J. Liu, F. Ishikawa, and P.D. Ye Nat Nanotechnol 2 2007 378
165. D. Chen, J. Xu, B. Liang, X.F. Wang, P.C. Chen, and C.W. Zhou J Mater Chem 21 2011 17236
166. Z.M. Zeng, K. Wang, Z.X. Zhang, J.J. Chen, and W.L. Zhou Nanotechnology 20 2009
167. T.Y. Wei, P.H. Yeh, S.Y. Lu, and Z. Lin-Wang J Am Chem Soc 131 2009 17690
168. L. Liao, Z. Zhang, B. Yan, Z. Zheng, Q.L. Bao, and T. Wu Nanotechnology 20 2009
169. K. Skucha, Z.Y. Fan, K. Jeon, A. Javey, and B. Boser Sensor Actuat B-Chem 145 2010 232
170. S.C. Hung, C.W. Chen, C.Y. Shieh, G.C. Chi, R. Fan, and S.J. Pearton Appl Phys Lett 2011 98
171. N. Singh, C.Y. Yan, P.S. Lee, and E. Comini Nanoscale 3 2011 1760
172. D.H. Zhang, Z.Q. Liu, C. Li, T. Tang, X.L. Liu, and S. Han Nano Lett 4 2004 1919
173. C. Li, D.H. Zhang, X.L. Liu, S. Han, T. Tang, and J. Han Appl Phys Lett 82 2003 1613
174. C. Li, D.H. Zhang, B. Lei, S. Han, X.L. Liu, and C.W. Zhou J Phys Chem B 107 2003 12451
175. X.Y. Xue, Y.J. Chen, Y.G. Liu, S.L. Shi, Y.G. Wang, and T.H. Wang Appl Phys Lett 2006 88
176. Y. Zhang, A. Kolmakov, S. Chretien, H. Metiu, and M. Moskovits Nano Lett 4 2004 403
177. X.H. Wang, J. Zhang, and Z.Q. Zhu Appl Surf Sci 252 2006 2404
178. J.J. Velasco-Velez, A. Chaiyboun, C. Wilbertz, J. Woellenstein, M. Bauersfeld, and T. Doll Phys Status Solidi A 206 2009 474
179. Whitfield GC, Tuller HL. Quantitative evaluation of nanoelectrochemical properties of thin film transistor based chemical sensors. Abstract, 14th international meeting on chemical sensors; 20-23 May, 2012, Nuremberg, Germany.
180. D.H. Zhang Mater Chem Phys 45 1996 248
181. Whitfield GW. PhD thesis, Department of Materials Science and Engineering, MIT, 2012.
182. Volanti DP, Felix AA, Orlandi MO, Whitfield G, Yang DJ, Longo E, et al. Adv Funct Mater 2012. http://dx.doi.org/10.1002/adfm.201202332.
183. N. Barsan, C. Simion, T. Heine, S. Pokhrel, and U. Weimar J Electroceram 25 2010 11
184. H.G. Moon, Y.S. Shim, D.H. Kim, H.Y. Jeong, M. Jeong, and J.Y. Jung Sci Rep 2 2012 588