Sharp transition from ripple patterns to a flat surface for ion beam erosion of Si with simultaneous co-deposition of iron

AIP Advances

Volumn 2, Issue 3, 2012, Pages

  Zhang, K ^a   Brotzmann M ^a   Hofsass H ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; EROSION; ION BEAMS; ION BOMBARDMENT; IONS; IRON; PHASE SEPARATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICIDES; SILICON; SURFACE ROUGHNESS;

KR ION IRRADIATIONS; PATTERN FORMATION; QUANTITATIVE CORRELATION; RANDOMLY DISTRIBUTED; SHARP TRANSITION; SURFACE COVERAGES; TRANSITION REGIMES; XE ION-IRRADIATION;

IRON METALLOGRAPHY;

EID: 84872615981     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4739843     Document Type: Article

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