Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 221-225

  Nikolaeva, Miglena ^a   Sendova Vassileva, M ^a   Dimova Malinovska, D ^a   Karpuzov, D ^b   Pivin, J C ^c   Beshkov, G ^d  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

^c CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES   (France)

^d INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Co sputtering; Infrared spectroscopy; Ion implantation; Iron silicides; XPS

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

IRON SILICIDES;

IRON COMPOUNDS;

EID: 0037168502     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00335-4     Document Type: Conference Paper

References (22)

1. Derrien J., Chevrier J., Le Thanh V., Crumbaker T.E., Natoli J.Y., Berbezier I. Appl Surf Sci. 70/71:1993;546. (Review paper) Derrien J., Chevrier J., Le Thanh V., Berbezier I. Appl Surf Sci. 73:1993;90. (Review paper).
2. Derrien J., Chevrier J., Le Thanh V., Crumbaker T.E., Natoli J.Y., Berbezier I. Appl Surf Sci. 70/71:1993;546. (Review paper) Derrien J., Chevrier J., Le Thanh V., Berbezier I. Appl Surf Sci. 73:1993;90. (Review paper).
3. Vazquez de Parga A.L., de la Figuera J., Ocal C., Miranda R. Ultramicroscopy. 42-44:1992;845.
4. Le Thanh V., Chevrier J., Derrien J. Phys Rev B. 46:1992;15946.
5. Onda N., Henz J., Muler E., Mader K.M., Von Kanel H. Appl Surf Sci. 56-58:1992;421 Onda N., Henz J., Muler E., Mader K.M., Von Kanel H. Phys Rev B. 47:1993;10567.
6. Onda N., Henz J., Muler E., Mader K.M., Von Kanel H. Appl Surf Sci. 56-58:1992;421 Onda N., Henz J., Muler E., Mader K.M., Von Kanel H. Phys Rev B. 47:1993;10567.
7. Crumbaker T.E., Natoli J.Y., Berbezier I., Derrien J. J Cryst Growth. 127:1993;158.
8. Lin X.W., Behar M., Desimoni J., Bernas H., Liliental-Weber Z., Wasburn J. Appl Phys Lett. 62:1993;306.
9. Muller O., Mantl S., Radermacher K., Bay H.L., Crecelius G., Dieker C., Mesters S. Appl Surf Sci. 73:1993;141.
10. Regolini J.L., Trincat F., Berbezier I., Shapira Y. Appl Phys Lett. 60:1992;956.
11. Birkholz U., Hinkenrath H., Naegele H., Uhle N. Phys Stat Sol. 30:1968;K18 Birkholz U., Naegele H. Phys Stat Sol. 39:1970;197.
12. Birkholz U., Hinkenrath H., Naegele H., Uhle N. Phys Stat Sol. 30:1968;K18 Birkholz U., Naegele H. Phys Stat Sol. 39:1970;197.
13. Borghesi A., Piaggia A., Stela A., Guizzetti G., Nava F., Santoro G. Anastassakis E.M., Joannopoulos J.D. Proceedings of the 20th ICPS. 1991;197 World Scientific, Singapore.
14. Andelov Ch., Baleva M., Darakchieva V., Goranova E.E., Sutchev M. Marshall J.M., Petrov A.G., Vavrek A., Nehseva D., Dimiva-Malinovska D., Maud J.M. Materials for information technology in the new millenium. 2001;428-431 Bookcraft, UK.
15. Swart H.C., Berning G.L.P. Appl Surf Sci. 78:1994;77.
16. Ruehrnschopf K., Borgmann D., Wedler G. This Solid Films. 280:1996;171.
17. de Crescenzi M., Gaggiotti G., Motta N., Patella F., Balzarotti A. Phys Rev B. 42:1990;5871.
18. Zhu Qi-.Gao., Iwasaki H., Williams E.D., Park R.L. J Appl Phys. 60:1986;2629.
19. Grunthaner P.J., Grunthaner F.J., Madhukar A. J Vac Sci Technol. 20:1982;680.
20. Doniach S., Sinjic M. J Phys C. 3:1970;285.
21. Egert B., Panzner G. Phys Rev B. 29:1984;2091.
22. NIST Reference Database ( http://srdata.nist.gov/xps/).