Crystallization of amorphous SiC and superhardness effect in CrAlN/SiC nanomultilayered films

Surface and Coatings Technology

Volumn 214, Issue , 2013, Pages 168-172

  Li, Wei ^a   Liu, Ping ^a   Zhao, Yongsheng ^a   Ma, Fengcang ^a   Liu, Xinkuan ^a   Chen, Xiaohong ^a   He, Daihua ^a  

^a UNIVERSITY OF SHANGHAI FOR SCIENCE AND TECHNOLOGY   (China)

Author keywords

CrAlN SiC nanomultilayer; Epitaxial growth; Magnetron sputtering; Microstructure; Superhardness effect

Indexed keywords

AMORPHOUS STATE; COHERENT GROWTH; CRALN/SIC NANOMULTILAYER; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HARDNESS AND ELASTIC MODULUS; LAYER THICKNESS; MAXIMUM HARDNESS; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NANOINDENTATION TECHNIQUES; NANOMULTILAYERS; REACTIVE MAGNETRON SPUTTERING; SUPERHARDNESS EFFECT; TEMPLATE EFFECTS;

AMORPHOUS FILMS; ELASTIC MODULI; EPITAXIAL GROWTH; FIELD EMISSION MICROSCOPES; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SILICON CARBIDE;

EID: 84871607681     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.11.019     Document Type: Article

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