Microstructure and mechanical properties of TiAlN/SiO2 nanomultilayers synthesized by reactive magnetron sputtering

Materials Letters

Volumn 65, Issue 4, 2011, Pages 636-638

  Li, Wei ^a   Liu, Ping ^a   Wang, Juntao ^a   Ma, Fengcang ^a   Liu, Xinkuan ^a   Chen, Xiaohong ^a   Yang, Lihong ^a  

^a UNIVERSITY OF SHANGHAI FOR SCIENCE AND TECHNOLOGY   (China)

Author keywords

Epitaxial growth; Magnetron sputtering; Mechanical property; Microstructure; TiAlN SiO2 nanomultilayer

Indexed keywords

AMORPHOUS STATE; COHERENT GROWTH; HARDNESS AND ELASTIC MODULUS; LAYER THICKNESS; MAXIMUM HARDNESS; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NANOMULTILAYERS; REACTIVE MAGNETRON SPUTTERING; TEMPLATE EFFECTS; TIALN/SIO2 NANOMULTILAYER;

ELASTIC MODULI; EPITAXIAL GROWTH; HARDNESS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; SILICON COMPOUNDS; SODIUM CHLORIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

MECHANICAL PROPERTIES;

EID: 78650262231     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.11.073     Document Type: Article

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